公开(公告)号：US20240131548A1

公开(公告)日：2024-04-25

申请号：US18547392

申请日：2021-03-01

Applicant: ABB Schweiz AG

Inventor： Yngve Finnestad ,  Jakob Trydal ,  Morten Mossige ,  Bjarne Sandvik

IPC: B05B15/55 ,  B05B3/10 ,  B05B13/04

CPC classification number: B05B15/55 ,  B05B3/1035 ,  B05B3/1085 ,  B05B13/0431

Abstract: A method of monitoring cleaning of an apparatus for applying a coating medium to an object, the apparatus including a rotatable deflecting element for atomizing the coating medium; and a cleaning medium line for conducting a cleaning medium to the deflecting element; where the method including commanding performance of a cleaning operation including delivery of the cleaning medium through the cleaning medium line towards the deflecting element while rotating the deflecting element; collecting operational values of at least one operational parameter of the apparatus for the cleaning operation; comparing the operational values with reference values of the at least one operational parameter for the cleaning operation; and determining whether the cleaning operation was successful or unsuccessful based on the comparison. A method of cleaning an apparatus for applying a coating medium to an object is also provided.

公开(公告)号：US20240226944A9

公开(公告)日：2024-07-11

申请号：US18547392

申请日：2021-03-01

Applicant: ABB Schweiz AG

Inventor： Yngve Finnestad ,  Jakob Trydal ,  Morten Mossige ,  Bjarne Sandvik

IPC: B05B15/55 ,  B05B3/10 ,  B05B13/04

CPC classification number: B05B15/55 ,  B05B3/1035 ,  B05B3/1085 ,  B05B13/0431

Abstract: A method of monitoring cleaning of an apparatus for applying a coating medium to an object, the apparatus including a rotatable deflecting element for atomizing the coating medium; and a cleaning medium line for conducting a cleaning medium to the deflecting element; where the method including commanding performance of a cleaning operation including delivery of the cleaning medium through the cleaning medium line towards the deflecting element while rotating the deflecting element; collecting operational values of at least one operational parameter of the apparatus for the cleaning operation; comparing the operational values with reference values of the at least one operational parameter for the cleaning operation; and determining whether the cleaning operation was successful or unsuccessful based on the comparison. A method of cleaning an apparatus for applying a coating medium to an object is also provided.