公开(公告)号：EP2889333A4

公开(公告)日：2016-04-20

申请号：EP13831603

申请日：2013-08-19

Applicant: ADEKA CORP

Inventor： HONMA GO ,  KONDO YOSHIHIDE ,  SHIRAI HIROAKI

IPC: C08L101/00 ,  C01B33/18 ,  C08K5/19 ,  C08K9/04 ,  C09C1/28 ,  C09C1/30 ,  C09C3/08 ,  C09C3/10 ,  C09C3/12

CPC classification number: C08K9/04 ,  C01B33/18 ,  C01P2006/60 ,  C08K5/19 ,  C09C1/3063 ,  C09C1/3072

Abstract: An object of the present invention is to provide the following modified silica composition. When the modified silica composition is added to a resin composition, the modified silica composition maintains the transparency of a resin while improving the scratch resistance of the resin composition, and when the resin composition is applied to a thin film such as a film, the warping of the film is suppressed. In order to achieve the object described above, provided is a silica composition, including: compound (A) represented by the following general formula (1); and acryl- or methacryl-modified silica particles (B): where X - represents a halogen ion or a methyl sulfate ion, R 1 to R 4 each independently represent a hydrocarbon group having 1 to 36 carbon atoms, a hydrocarbon group having 1 to 36 carbon atoms that has any one or more kinds of substituents selected from an ester group, an amide group, and a hydroxyl group, or a polyether group represented by the following general formula (2), provided that at least one of R 1 to R 4 needs to represent a polyether group represented by the following general formula (2): where m represents a number of from 1 to 100 and R 5 represents an alkylene group having 2 to 4 carbon atoms.