1.
    发明专利
    未知

    公开(公告)号:DE60125839T8

    公开(公告)日:2007-08-30

    申请号:DE60125839

    申请日:2001-12-25

    Applicant: ADEKA CORP

    Abstract: Disclosed are surfactants represented by the following formula (1): wherein R represents a branched aliphatic hydrocarbon group, a secondary aliphatic hydrocarbon group or a branched aliphatic acyl group, AO and AO' each independently represents an oxyalkylene group having 2 to 4 carbon atoms, L represents a group represented by formula (2) to be described below, z stands for a number of from 1 to 10, X represents a hydrogen atom or an ionic hydrophilic group, m stands for a number of from 0 to 1,000, and n stands for a number of from 0 to 1,000. wherein R and R each independently represents a hydrogen atom or a methyl group, x stands for a number of from 0 to 12, and y stands for a number of 0 or 1. These surfactants do not contain any phenyl ether group considered to have significant effects on the environment, such as a nonylphenyl group, and have performance comparable with reactive surfactants containing one or more phenyl ether groups. Emulsifiers for emulsion polymerization, dispersants for dispersion polymerization and resin modifiers, all of which contain the surfactants, are also disclosed.

    2.
    发明专利
    未知

    公开(公告)号:DE60125839D1

    公开(公告)日:2007-02-15

    申请号:DE60125839

    申请日:2001-12-25

    Applicant: ADEKA CORP

    Abstract: Disclosed are surfactants represented by the following formula (1): wherein R represents a branched aliphatic hydrocarbon group, a secondary aliphatic hydrocarbon group or a branched aliphatic acyl group, AO and AO' each independently represents an oxyalkylene group having 2 to 4 carbon atoms, L represents a group represented by formula (2) to be described below, z stands for a number of from 1 to 10, X represents a hydrogen atom or an ionic hydrophilic group, m stands for a number of from 0 to 1,000, and n stands for a number of from 0 to 1,000. wherein R and R each independently represents a hydrogen atom or a methyl group, x stands for a number of from 0 to 12, and y stands for a number of 0 or 1. These surfactants do not contain any phenyl ether group considered to have significant effects on the environment, such as a nonylphenyl group, and have performance comparable with reactive surfactants containing one or more phenyl ether groups. Emulsifiers for emulsion polymerization, dispersants for dispersion polymerization and resin modifiers, all of which contain the surfactants, are also disclosed.

    TENSIOACTIVOS.
    3.
    发明专利

    公开(公告)号:ES2276745T3

    公开(公告)日:2007-07-01

    申请号:ES01273340

    申请日:2001-12-25

    Applicant: ADEKA CORP

    Abstract: Un tensioactivo representado por la siguiente fórmula (1): en la que R1 representa un grupo hidrocarburo alifático ramificado o grupo acilo alifático ramificado, que tiene de 8 a 36 átomos de carbono y contiene al menos tres grupos metilo, cada AO y AO'' representa independientemente un grupo oxialquileno que tiene de 2 a 4 átomos de carbono, L representa un grupo representado por la fórmula (2) que se describirá a continuación, z representa un número de 1 a 10, X representa un átomo de hidrógeno o un grupo hidrófilo iónico, m representa un número de 0 a 1.000, y n representa un número de 0 a 1.000, en la que cada R2 y R3 representa independientemente un átomo de hidrógeno o un grupo metilo, x representa un número de 0 a 12, e y representa un número de 0 o 1.

    4.
    发明专利
    未知

    公开(公告)号:DE60125839T2

    公开(公告)日:2007-05-03

    申请号:DE60125839

    申请日:2001-12-25

    Applicant: ADEKA CORP

    Abstract: Disclosed are surfactants represented by the following formula (1): wherein R represents a branched aliphatic hydrocarbon group, a secondary aliphatic hydrocarbon group or a branched aliphatic acyl group, AO and AO' each independently represents an oxyalkylene group having 2 to 4 carbon atoms, L represents a group represented by formula (2) to be described below, z stands for a number of from 1 to 10, X represents a hydrogen atom or an ionic hydrophilic group, m stands for a number of from 0 to 1,000, and n stands for a number of from 0 to 1,000. wherein R and R each independently represents a hydrogen atom or a methyl group, x stands for a number of from 0 to 12, and y stands for a number of 0 or 1. These surfactants do not contain any phenyl ether group considered to have significant effects on the environment, such as a nonylphenyl group, and have performance comparable with reactive surfactants containing one or more phenyl ether groups. Emulsifiers for emulsion polymerization, dispersants for dispersion polymerization and resin modifiers, all of which contain the surfactants, are also disclosed.

    5.
    发明专利
    未知

    公开(公告)号:AT350404T

    公开(公告)日:2007-01-15

    申请号:AT01273340

    申请日:2001-12-25

    Applicant: ADEKA CORP

    Abstract: Disclosed are surfactants represented by the following formula (1): wherein R represents a branched aliphatic hydrocarbon group, a secondary aliphatic hydrocarbon group or a branched aliphatic acyl group, AO and AO' each independently represents an oxyalkylene group having 2 to 4 carbon atoms, L represents a group represented by formula (2) to be described below, z stands for a number of from 1 to 10, X represents a hydrogen atom or an ionic hydrophilic group, m stands for a number of from 0 to 1,000, and n stands for a number of from 0 to 1,000. wherein R and R each independently represents a hydrogen atom or a methyl group, x stands for a number of from 0 to 12, and y stands for a number of 0 or 1. These surfactants do not contain any phenyl ether group considered to have significant effects on the environment, such as a nonylphenyl group, and have performance comparable with reactive surfactants containing one or more phenyl ether groups. Emulsifiers for emulsion polymerization, dispersants for dispersion polymerization and resin modifiers, all of which contain the surfactants, are also disclosed.

    Photocurable resin and dispersant using the same
    7.
    发明专利
    Photocurable resin and dispersant using the same 有权
    使用相同的光学树脂和分散剂

    公开(公告)号:JP2010121070A

    公开(公告)日:2010-06-03

    申请号:JP2008297000

    申请日:2008-11-20

    Abstract: PROBLEM TO BE SOLVED: To provide a dispersant having high dispersibility, and exhibiting high photocurability when mixed into a coating film and the adhesivity to a substrate. SOLUTION: The photocurable resin as the dispersant is prepared by a process wherein (A) a diisocyanate compound is subjected to the addition reaction with (B) a compound with a number-average molecular weight of 300-5,000 having, in one molecule, one or two hydroxy groups and with (C) a compound having in one molecule two hydroxy groups and two ethylenically unsaturated groups, followed by conducting a Michael addition reaction of (D) a compound having, in one molecule, an active hydrogen atom and a tertiary amino group. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供具有高分散性的分散剂,并且当混合到涂膜中时表现出高的光固化性和对基材的粘附性。 解决方案:作为分散剂的光固化树脂通过以下方法制备:其中(A)二异氰酸酯化合物与(B)数均分子量为300-5,000的化合物进行加成反应,其中一种 分子,一个或两个羟基和(C)具有一个分子中的两个羟基和两个烯键式不饱和基团的化合物,然后进行(D)在一个分子中具有活性氢原子的化合物的迈克尔加成反应 和叔氨基。 版权所有(C)2010,JPO&INPIT

    Concentrated developing solution for radiation-sensitive composition
    8.
    发明专利
    Concentrated developing solution for radiation-sensitive composition 审中-公开
    用于辐射敏感组合物的浓缩发展解决方案

    公开(公告)号:JP2009251534A

    公开(公告)日:2009-10-29

    申请号:JP2008102890

    申请日:2008-04-10

    Abstract: PROBLEM TO BE SOLVED: To provide a concentrated developing solution for a radiation-sensitive composition providing good development without residual films or missing pixels and achieving high concentration.
    SOLUTION: The concentrated developing solution for the radiation-sensitive composition is made of (A) an alkaline metal carbonate, (B) an alkaline metal hydrogen carbonate, (C) a surface active agent component made of at least one of a polyalkylene oxide adduct of cumylphenol and a polyalkylene oxide adduct of phenylethyl group substitution phenol, (D) a specific solubilizing agent component, and (E) water.
    COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题:提供一种提供良好显影的辐射敏感组合物的浓缩显影液,无残留膜或缺失像素并实现高浓度。 解决方案:用于辐射敏感组合物的浓缩显影液由(A)碱金属碳酸盐,(B)碱金属碳酸氢盐,(C)由以下物质中的至少一种制成的表面活性剂成分: 异丙苯酚的聚环氧烷加成物和苯基乙基取代酚的聚环氧烷加成物,(D)特定的增溶剂成分和(E)水。 版权所有(C)2010,JPO&INPIT

    Polyamide resin composition
    9.
    发明专利
    Polyamide resin composition 审中-公开
    聚酰胺树脂组合物

    公开(公告)号:JP2008208383A

    公开(公告)日:2008-09-11

    申请号:JP2008149216

    申请日:2008-06-06

    Abstract: PROBLEM TO BE SOLVED: To provide a polyamide resin composition excellent in fluidity and giving moldings excellent in anti-blistering property, mechanical strength, and sliding property. SOLUTION: This polyamide resin composition contains 100 parts by weight polyamide resin having a melting point of 270°C-340°C (A), 0.2-20 parts by weight compound represented by formula (I) (wherein R 1 and R 2 each represent an alkyl group having not less than 9 carbons, and m and n each represent an integer of 1-3) (B), and 1-100 parts by weight bromine flame-retardant (C). COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题:提供流动性优异的聚酰胺树脂组合物,并提供抗起泡性,机械强度和滑动性优异的模制品。 解决方案:该聚酰胺树脂组合物含有100重量份的熔点为270℃-340℃(A)的聚酰胺树脂,0.2-20重量份由式(I)表示的化合物(其中R 1 和R 2 各自表示不少于9个碳的烷基,m和n各自表示1-3)(B)的整数,1-100份 溴阻燃剂(C)。 版权所有(C)2008,JPO&INPIT

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