公开(公告)号：JPH0836987A

公开(公告)日：1996-02-06

申请号：JP5136895

申请日：1995-03-10

Applicant: ADVANCED MICRO DEVICES INC

Inventor： DONARUDO ERU FURIIDO ,  BAN RE ,  DENBAA ERU DORUMAN

IPC: G21K5/04 ,  C23C14/48 ,  H01J37/147 ,  H01J37/317 ,  H01L21/265

Abstract: PURPOSE: To provide an ion implanter having a modulator for giving a variable frequency modulating/scanning signal. CONSTITUTION: A scanning signal is reliably adapted, by a modulator 54, substantially not to retrace during a scanning cycle and during another scanning cycle following that. It is made possible to bring about more uniform dopant on an upper surface of a wafer by minimizing retrace and, when heavy atomic speces are thereby implanted therein, an unsufficient doping area which is likely to be produced between retraced beam widths is reduced or minimized.