Electromagnetic waveguide and plasma source
    1.
    发明授权
    Electromagnetic waveguide and plasma source 有权
    电磁波导和等离子体源

    公开(公告)号:US09265138B2

    公开(公告)日:2016-02-16

    申请号:US13955193

    申请日:2013-07-31

    CPC classification number: H05H1/30

    Abstract: A method comprises: aligning a plasma torch within an iris cavity of an iris along a first axis between first and second iris slots having heights less than 70% of the diameter of the torch; and generating an electromagnetic field having field lines along a second axis. The field comprises a component that is substantially transverse to the first direction. An apparatus is also described.

    Abstract translation: 一种方法包括:沿着第一和第二虹膜槽之间的第一轴在虹膜的虹膜腔内对准等离子体焰炬,所述第一和第二虹膜槽具有小于所述割炬直径的70%的高度; 以及产生具有沿着第二轴的场线的电磁场。 该场包括基​​本上横向于第一方向的部件。 还描述了一种装置。

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