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公开(公告)号：WO2022226424A1
公开(公告)日：2022-10-27
申请号：PCT/US2022/026224
申请日：2022-04-25
Applicant: ALIGN TECHNOLOGY, INC.
Inventor： CHOUDHARY, Umesh Upendra , SU, Jessica Kalay , COLE, Michael Christopher , CHAVEZ, Jennifer Marie
IPC: C08F293/00 , C08F220/18 , B33Y70/00 , B33Y80/00 , C08F8/12 , A61C13/00 , A61K6/887
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.
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公开(公告)号：WO2022226416A1
公开(公告)日：2022-10-27
申请号：PCT/US2022/026206
申请日：2022-04-25
Applicant: ALIGN TECHNOLOGY, INC.
Inventor： CHOUDHARY, Umesh Upendra , SU, Jessica Kalay , CHAVEZ, Jennifer Marie , COLE, Michael Christopher , THAI, Raymond Bao
IPC: C07C69/54 , C07C69/86 , B33Y70/00 , C07F7/02 , A61C13/00 , C08F220/18 , A61K6/887 , C07C233/09 , B33Y80/00 , C07D201/00 , C07F7/00 , C08F8/12 , C08F226/06 , C08F293/00 , C08F220/30
Abstract: The present disclosure provides photo-polymerizable monomers, photo-curable resins comprising one or more of such monomers, as well as polymeric materials formed from the photo-curable resins. Further provided herein are methods of producing the compositions and using the same for the fabrication of medical devices, such as orthodontic appliances.
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公开(公告)号：WO2023064488A1
公开(公告)日：2023-04-20
申请号：PCT/US2022/046597
申请日：2022-10-13
Applicant: ALIGN TECHNOLOGY, INC.
Inventor： MEENAKSHISUNDARAM, Viswanath , DORFINGER, Peter , CHOUDHARY, Umesh Upendra , COLE, Michael Christopher
IPC: B29C64/124 , B29C64/214 , B29C64/223 , B29C64/227 , B29C64/295 , B29C64/35 , B29C64/393 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02 , B29C64/255
Abstract: In some embodiments, a system includes a carrier film (260), a first blade (270A) configured to form a layer of resin on the carrier film, a second blade (270B) configured to prevent printed features from contacting the first blade, and a build platform (120), where a portion of the layer of resin is to be added to an object being formed on the build platform. In some embodiments, a system includes a build platform and one or more blades configured to provide layers of resin to form an object on the build platform, where at least a first blade is configured to vibrate to reduce viscosity of the layers of resin. In some embodiments, a system includes a partial enclosure (280) configured to hold resin, one or more structures configured to at least partially cover the resin to prevent evaporation, and a build platform configured to support an object being formed from the resin.
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Patent Agency Ranking
公开(公告)号：EP4326790A1
公开(公告)日：2024-02-28
申请号：EP22723309.5
申请日：2022-04-25
Applicant: Align Technology, Inc.
Inventor： CHOUDHARY, Umesh Upendra , SU, Jessica Kalay , COLE, Michael Christopher , CHAVEZ, Jennifer Marie
IPC: C08F293/00 , C08F220/18 , B33Y70/00 , B33Y80/00 , C08F8/12 , A61C13/00 , A61K6/887
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公开(公告)号：EP4549150A1
公开(公告)日：2025-05-07
申请号：EP23020486.9
申请日：2023-10-30
Applicant: Cubicure GmbH , Align Technology, Inc.
Inventor： CONCEICAO, Rafaela , FRANK, Christian , KURY, Markus , GORSCHE, Christian , CHOUDHARY, Umesh Upendra , SU, Jessica Kalay , COLE, Michael Christopher
IPC: B33Y70/00 , C07C69/75 , C08F220/28 , C08F222/10 , C08F265/06 , C08F267/06
Abstract: Resin composition for three-dimensional printing, the resin composition comprising a) at least one curable oligomer or prepolymer resin component (compound B), and b) a reactive diluent (compound A), the reactive diluent having one or more chemical species being a cycloaliphatic compound according to formula (I):
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公开(公告)号：EP4457252A1
公开(公告)日：2024-11-06
申请号：EP22854400.3
申请日：2022-12-29
Applicant: Align Technology, Inc.
Inventor： CHOUDHARY, Umesh Upendra , SU, Jessica Kalay
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公开(公告)号：EP4415952A1
公开(公告)日：2024-08-21
申请号：EP22802370.1
申请日：2022-10-13
Applicant: Align Technology, Inc.
Inventor： MEENAKSHISUNDARAM, Viswanath , DORFINGER, Peter , CHOUDHARY, Umesh Upendra , COLE, Michael Christopher
IPC: B29C64/124 , B29C64/214 , B29C64/223 , B29C64/227 , B29C64/295 , B29C64/35 , B29C64/393 , B33Y10/00 , B33Y30/00 , B33Y40/00 , B33Y50/02 , B29C64/255
CPC classification number: B29C64/223 , B29C64/35 , B29C64/124 , B29C64/214 , B29C64/295 , B29C64/227 , B33Y10/00 , B33Y30/00 , B33Y50/02 , B29C64/393 , B33Y40/00 , B29C64/255
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公开(公告)号：EP4326703A1
公开(公告)日：2024-02-28
申请号：EP22726562.6
申请日：2022-04-25
Applicant: Align Technology, Inc.
Inventor： CHOUDHARY, Umesh Upendra , SU, Jessica Kalay , CHAVEZ, Jennifer Marie , COLE, Michael Christopher , THAI, Raymond Bao
IPC: C07C69/54 , C07C69/86 , B33Y70/00 , C07F7/02 , A61C13/00 , C08F220/18 , A61K6/887 , C07C233/09 , B33Y80/00 , C07D201/00 , C07F7/00 , C08F8/12 , C08F226/06 , C08F293/00 , C08F220/30
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