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Patent Agency Ranking
公开(公告)号：ES2949415T3
公开(公告)日：2023-09-28
申请号：ES19172856
申请日：2019-05-06
Applicant: ALIGN TECHNOLOGY INC
Inventor： LISKA ROBERT , GORSCHE CHRISTIAN , HARAKALY GYÖRGY , KURY MARKUS , STAMPFL JÜRGEN , DORFINGER PETER , CHEN YAN , LI CHUNHUA , KAZA SRINIVAS
IPC: C08G18/10 , A61C7/00 , A61C7/08 , A61C13/00 , B33Y10/00 , B33Y70/00 , B33Y80/00 , C08G18/32 , C08G18/44 , C08G18/48 , C08G18/50 , C08G18/67 , C08G18/71 , C08G18/73 , C08G18/75
Abstract: La presente invención se refiere a una composición curable para uso en un proceso de fotopolimerización a alta temperatura basado en litografía, que comprende al menos los componentes polimerizables definidos A a C, de los cuales: el componente A es al menos un dimetacrilato oligomérico de fórmula química (I) y sirve como modificador de la temperatura de transición vítrea; el componente B al menos un poli)carbonato dimetacrilato de (poli)uretano, dado el caso modificado con poliéter, de una de las fórmulas químicas (II), (III), (IV) o (V) y sirve como modificador de la tenacidad; y Componente C El componente C es al menos un diluyente reactivo basado en metacrilato mono o multifuncional. (Traducción automática con Google Translate, sin valor legal)
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公开(公告)号：CA3098621A1
公开(公告)日：2019-11-07
申请号：CA3098621
申请日：2019-05-03
Applicant: ALIGN TECHNOLOGY INC
Inventor： LISKA ROBERT , GORSCHE CHRISTIAN , HARAKALY GYORGY , KURY MARKUS , STAMPFL JURGEN , DORFINGER PETER , CHEN YAN , LI CHUNHUA , KAZA SRINIVAS
IPC: A61C7/00 , B33Y80/00 , C08F236/02 , C08G18/75
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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公开(公告)号：AU2019262641B2
公开(公告)日：2025-02-06
申请号：AU2019262641
申请日：2019-05-03
Applicant: ALIGN TECHNOLOGY INC
Inventor： LISKA ROBERT , GORSCHE CHRISTIAN , HARAKALY GYÖRGY , KURY MARKUS , STAMPFL JÜRGEN , DORFINGER PETER , CHEN YAN , LI CHUNHUA , KAZA SRINIVAS
IPC: A61K6/887 , A61C7/00 , B33Y80/00 , C08F236/02 , C08G18/75
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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公开(公告)号：PL3564282T3
公开(公告)日：2023-10-23
申请号：PL19172856
申请日：2019-05-06
Applicant: ALIGN TECHNOLOGY INC
Inventor： LISKA ROBERT , GORSCHE CHRISTIAN , HARAKALY GYÖRGY , KURY MARKUS , STAMPFL JÜRGEN , DORFINGER PETER , CHEN YAN , LI CHUNHUA , KAZA SRINIVAS
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公开(公告)号：AU2019262641A1
公开(公告)日：2020-12-03
申请号：AU2019262641
申请日：2019-05-03
Applicant: ALIGN TECHNOLOGY INC
Inventor： LISKA ROBERT , GORSCHE CHRISTIAN , HARAKALY GYÖRGY , KURY MARKUS , STAMPFL JÜRGEN , DORFINGER PETER , CHEN YAN , LI CHUNHUA , KAZA SRINIVAS
IPC: A61K6/887 , A61C7/00 , B33Y80/00 , C08F236/02 , C08G18/75
Abstract: Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, a method of producing crosslinked polymers using said curable compositions, crosslinked polymers thus produced, and orthodontic appliances comprising the crosslinked polymers.
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