公开(公告)号：JP2001055600A

公开(公告)日：2001-02-27

申请号：JP22721399

申请日：1999-08-11

Applicant: ALLIED SIGNAL INC

Inventor： OANA M REONTE ,  NAKANO TADASHI ,  KELLY M BERIZU ,  CHRYSLER LAW

IPC: C08J5/18 ,  C08L71/12 ,  C09D9/00 ,  C11D7/26 ,  C11D7/50

Abstract: PROBLEM TO BE SOLVED: To enable edge beads of a dielectric film to be removed and a processing apparatus to be rinsed by depositing a coating solution containing a dielectric material and a solvent on a substrate and depositing a specific aromatic aliphatic ether on the edge part of the substrate surface. SOLUTION: A coating solution comprising 1-50 wt.% dielectric material and 50-99 wt.% aromatic aliphatic ether represented by the formula (e.g. anisole or phenetole) is prepared and is caused to pass through a mocropore filtering apparatus. The coating solution is poured by portions onto the surface of a substrate, such as a rotating wafer being coated by spin coating. After the removal of edge beads formed, the applied coating solution is baked under heating at 70-350 deg.C and is cured at 300-450 deg.C to form a dielectric film. A polyarylene ether and an organohydridesiloxane resin are examples of the dielectric material. In the formula, R is CnH2n+1 (wherein (n) is 1-6); and R1 to R5 are each CmH2m+1 (wherein (m) is 0-3).