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公开(公告)号：JP2013100196A
公开(公告)日：2013-05-23
申请号：JP2011244464
申请日：2011-11-08
Applicant: Apple Inc , アップル インコーポレイテッド , Hightech Engineering Kk , ハイテックエンジニアリング株式会社
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J , OKUDA NAOYUKI
IPC: C03C21/00
Abstract: PROBLEM TO BE SOLVED: To provide a glass tempering apparatus in which treating liquid can be replaced without stopping chemical tempering work for a long time and the whole of plate glass can be uniformly tempered.SOLUTION: In the glass tempering apparatus, the plate glass is chemically tempered by being immersed in treating liquid adjusted to a temperature range from the melting point of treating agent to the melting point+70°C. The apparatus comprises at least: a preheating oven for heating the plate glass to a temperature close to the temperature of the treating liquid; a chemical treatment tank provided with a control means to keep the temperature of treating liquid, a heater and a drain valve for discharging the treating liquid; a slow cooling oven for cooling chemically treated plate glass to a temperature of 120-80°C; a washing tank for washing the cooled plate glass; a drying means; a means to sequentially transfer the plate glass to the preheating oven, the chemical treatment tank, the slow cooling oven, the washing tank and the drying means in this order; and a supply tank for supplying the treating liquid to the chemical treatment tank. The chemical treatment tank has a means to agitate the treating liquid, and the supply tank has a means to melt the treating agent and a means to supply the treating liquid obtained by the melting means to the chemical treatment tank.
Abstract translation: 解决的问题：提供一种可以在不停止长时间的化学回火工作的情况下更换处理液体并且可以均匀地回火整个平板玻璃的玻璃回火设备。 解决方案：在玻璃回火装置中，通过浸入调节至处理剂的熔点至熔点+ 70℃的温度范围的处理液中，对平板玻璃进行化学回火。 该装置至少包括：用于将平板玻璃加热至接近处理液温度的温度的预热炉; 化学处理槽，设有控制装置以保持处理液的温度，加热器和排出阀，用于排出处理液; 用于将化学处理的平板玻璃冷却至120-80℃的缓慢冷却炉; 用于洗涤冷却的玻璃板的洗涤槽; 干燥装置; 依次将平板玻璃顺序地转移到预热炉，化学处理槽，缓慢冷却炉，洗涤槽和干燥装置的装置; 以及用于将处理液供给到化学处理槽的供给槽。 化学处理槽具有搅拌处理液的手段，供给罐具有使处理剂熔融的方法和将由熔融装置得到的处理液供给到化学处理槽的装置。 版权所有（C）2013，JPO＆INPIT
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公开(公告)号：AU2014315688B2
公开(公告)日：2017-05-04
申请号：AU2014315688
申请日：2014-07-30
Applicant: APPLE INC
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J
Abstract: An opaque cover is provided for a capacitive sensor. The cover includes a transparent substrate, and at least one white coating layer including white pigments disposed over at least one portion of the transparent substrate. The cover also includes a non-conductive mirror structure disposed over the at least one white coating layer. The non-conductive mirror structure includes a number of first dielectric layers having a first refractive index interleaved with second dielectric layers having a second refractive index. The first and second dielectric layers have dielectric constants below a threshold.
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公开(公告)号：AU2014315684B2
公开(公告)日：2017-07-13
申请号：AU2014315684
申请日：2014-07-29
Applicant: APPLE INC
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J
Abstract: An opaque cover for a capacitive sensor is provided. The cover includes a transparent substrate (202) and a black color stack disposed adjacent the transparent substrate. The black color stack includes a pigment stack having a first dielectric layer (204A), a second dielectric layer (204C), and a first light absorbing layer (204B positioned between the first and second dielectric layers. The light absorbing layer is one of tin, copper oxide or zinc oxide. The first dielectric layer (204A) has a first refractive index, is one of silicon oxide, silicon nitride or niobium oxide. The second dielectric layer, is one of silicon oxide, silicon nitride or niobium oxide, has a second refractive index different from the first refractive index. The black color stack also includes a plurality of second light absorption layers (204B) interleaved with a plurality of third dielectric layers (204A).
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Patent Agency Ranking
公开(公告)号：AU2014315688A1
公开(公告)日：2016-02-11
申请号：AU2014315688
申请日：2014-07-30
Applicant: APPLE INC
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J
Abstract: An opaque cover is provided for a capacitive sensor. The cover includes a transparent substrate, and at least one white coating layer including white pigments disposed over at least one portion of the transparent substrate. The cover also includes a non-conductive mirror structure disposed over the at least one white coating layer. The non-conductive mirror structure includes a number of first dielectric layers having a first refractive index interleaved with second dielectric layers having a second refractive index. The first and second dielectric layers have dielectric constants below a threshold.
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公开(公告)号：AU2014315684A1
公开(公告)日：2016-02-11
申请号：AU2014315684
申请日：2014-07-29
Applicant: APPLE INC
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J
Abstract: An opaque cover for a capacitive sensor is provided. The cover includes a transparent substrate (202) and a black color stack disposed adjacent the transparent substrate. The black color stack includes a pigment stack having a first dielectric layer (204A), a second dielectric layer (204C), and a first light absorbing layer (204B positioned between the first and second dielectric layers. The light absorbing layer is one of tin, copper oxide or zinc oxide. The first dielectric layer (204A) has a first refractive index, is one of silicon oxide, silicon nitride or niobium oxide. The second dielectric layer, is one of silicon oxide, silicon nitride or niobium oxide, has a second refractive index different from the first refractive index. The black color stack also includes a plurality of second light absorption layers (204B) interleaved with a plurality of third dielectric layers (204A).
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公开(公告)号：DE112015000639T5
公开(公告)日：2016-10-20
申请号：DE112015000639
申请日：2015-01-30
Applicant: APPLE INC
Inventor： MATSUYUKI NAOTO , WEBER DOUGLAS J
Abstract: Verfahren zum verbesserten Gießen von Keramikkomponenten. Ein bestimmtes solches Verfahren kann ein Absaugen einer Schlickermischung auf Keramikbasis und/oder ein Absaugen einer Komponentenform einschließen. Das Absaugen der Schlickermischung auf Keramikbasis und der Komponentenform kann erfolgen, um Luftblasen aus den jeweiligen Elementen zu entfernen. Insbesondere kann das Absaugen Luftblasen aus der Schlickermischung auf Keramikbasis bzw. aus einer Kavität der Komponentenform entfernen. Das Verfahren kann zudem ein Anordnen der Schlickermischung auf Keramikbasis in der Kavität der Komponentenform und ein kontinuierliches Absaugen der Kavität der Komponentenform, einschließlich der Schlickermischung auf Keramikbasis, für eine vorbestimmte Zeit einschließen, um jegliche zusätzliche, in der Schlickermischung auf Keramikbasis enthaltene Luftblasen zu entfernen. Schließlich kann das Verfahren ein Ausbilden einer Keramikkomponente innerhalb der kontinuierlich abgesaugten Kavität der Komponentenform für die Dauer der vorbestimmten Zeit einschließen. Die Keramikkomponente wird aus der Schlickermischung auf Keramikbasis ausgebildet.
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公开(公告)号：AU2012214225B2
公开(公告)日：2015-10-08
申请号：AU2012214225
申请日：2012-02-10
Applicant: APPLE INC
Inventor： WEBER DOUGLAS JOSEPH , MATSUYUKI NAOTO
Abstract: This is directed to a liquid vaporization process for depositing an oleophobic ingredient on a surface of an electronic device component using a PVD process. A raw liquid material that includes the oleophobic ingredient can be placed in a liquid supply system coupled to a vacuum chamber. The liquid supply system can be pressured by an inert gas to prevent undesired chemical reactions between the oleophobic ingredient and air. The liquid, including the oleophobic ingredient, can vaporize upon reaching the vaporizing unit, and the oleophobic ingredient can be deposited on the component.
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公开(公告)号：AU2012214225A1
公开(公告)日：2013-09-05
申请号：AU2012214225
申请日：2012-02-10
Applicant: APPLE INC
Inventor： WEBER DOUGLAS JOSEPH , MATSUYUKI NAOTO
Abstract: This is directed to a liquid vaporization process for depositing an oleophobic ingredient on a surface of an electronic device component using a PVD process. A raw liquid material that includes the oleophobic ingredient can be placed in a liquid supply system coupled to a vacuum chamber. The liquid supply system can be pressured by an inert gas to prevent undesired chemical reactions between the oleophobic ingredient and air. The liquid, including the oleophobic ingredient, can vaporize upon reaching the vaporizing unit, and the oleophobic ingredient can be deposited on the component.
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