3.
    发明专利
    未知

    公开(公告)号:DE2356674C2

    公开(公告)日:1983-11-03

    申请号:DE2356674

    申请日:1973-11-13

    Applicant: ASEA AB

    Abstract: A semiconductor of the kind comprising at least one pn-junction the doping of which in the p-region (n-region) increases continuously or gradually from the pn-junction, and also having an isolating surface layer at least at the marginal portion of said pn-junction. In this semiconductor a first portion of said surface layer is positioned outside the substantially p-doped (n-doped) region, and a second portion of said surface layer is positioned outside the n-doped (p-doped) region of said pn-junction, said first portion having a permanently negative (positive) surface charge relative to said second portion.

    5.
    发明专利
    未知

    公开(公告)号:SE375881B

    公开(公告)日:1975-04-28

    申请号:SE1493772

    申请日:1972-11-17

    Applicant: ASEA AB

    Abstract: A semiconductor of the kind comprising at least one pn-junction the doping of which in the p-region (n-region) increases continuously or gradually from the pn-junction, and also having an isolating surface layer at least at the marginal portion of said pn-junction. In this semiconductor a first portion of said surface layer is positioned outside the substantially p-doped (n-doped) region, and a second portion of said surface layer is positioned outside the n-doped (p-doped) region of said pn-junction, said first portion having a permanently negative (positive) surface charge relative to said second portion.

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