公开(公告)号：US20170160652A1

公开(公告)日：2017-06-08

申请号：US15438376

申请日：2017-02-21

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20170307986A1

公开(公告)日：2017-10-26

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US20150241796A1

公开(公告)日：2015-08-27

申请号：US14699468

申请日：2015-04-29

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME ,  Thomas VENTURINO

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.

Abstract translation: 讨论了用于控制光刻设备中的图案形成装置的温度的系统。 该系统包括构造成支撑图案形成装置的图案形成装置支撑件和被配置为在图案形成装置上提供基本均匀的温度分布的掩模版冷却系统。 标线冷却系统包括第一和第二气体入口阵列，其被配置为分别在第一和第二方向彼此相对的情况下分别跨越图案形成装置的表面沿着第一和第二方向提供第一和第二气流。 标线冷却系统还包括配置成控制气体入口的第一和第二阵列的操作的开关控制系统。

公开(公告)号：US20170363973A1

公开(公告)日：2017-12-21

申请号：US15540649

申请日：2015-12-02

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Thomas VENTURINO ,  Geoffrey Alan SCHULTZ ,  Daniel Nicholas GALBURT ,  Daniel Nathan BURBANK ,  Santiago E. DELPUERTO ,  Herman VOGEL ,  Johannes ONVLEE ,  Laurentius Johannes Adrianus VAN BOKHOVEN ,  Christopher Charles WARD

IPC: G03F7/20

Abstract: An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.

公开(公告)号：US20150301456A1

公开(公告)日：2015-10-22

申请号：US14439359

申请日：2013-10-21

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Earl William EBERT, JR. ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.

Abstract translation: 用于控制图案形成装置（1102）的温度的图案形成装置支撑件（1100）可以包括可移动部件（1104）。 可移动部件可以包括用于提供穿过图案形成装置的表面的气流的气体入口（1108）和用于提取气体流的气体出口（1110）。 图案形成装置支撑件还可以包括联接到管道（1114,1116）的气流发生器（1118），用于使气流从气体出口再循环到气体入口。