公开(公告)号：US20240302753A1

公开(公告)日：2024-09-12

申请号：US18284161

申请日：2022-03-21

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Mahesh Upendra AJGAONKAR ,  Gerardus SWINKELS ,  Laurentius VAN BOKHOVEN ,  Joost KLUGKIST ,  Koen BOS

IPC: G03F7/00 ,  G01K1/02 ,  G01K7/22 ,  G01K11/3206

CPC classification number: G03F7/70891 ,  G01K1/026 ,  G01K7/22 ,  G01K11/3206 ,  G03F7/702 ,  G03F7/70233 ,  G03F7/70316 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system, a projection system, a temperature-sensitive object, and a temperature sensor that includes a detector and waveguide device that is thermally coupled to the temperature-sensitive object and includes an input end, a downstream end, and first and second scattering features. The illumination system illuminates a pattern of a patterning device. The projection system projects an image of the pattern onto a substrate. Based on temperature, the first scattering feature reflects a first spectrum. Radiation not reflected by the first scattering feature is allowed downstream. Based on temperature, the second scattering feature reflects a second spectrum different from the first spectrum. Radiation not reflected by the second scattering feature is allowed downstream. The detector is disposed to receive radiation including the reflected first and second spectra from the input end and generates a measurement signal based on the received radiation.