公开(公告)号：US20160195821A1

公开(公告)日：2016-07-07

申请号：US14911452

申请日：2014-07-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel RIEPEN ,  Christianus Wilhelmus Johanne BERENDSEN ,  Anton Alexander DARHUBER ,  Hubertus Mattheus Joseph M WEDERSHOVEN ,  Josephus Catharina Henricus ZEEGERS

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus is configured to subject a photosensitive layer on a substrate to a patterned beam of radiation via a liquid. The immersion lithographic apparatus includes a moveable object having a surface, a fluid handling system to control a presence of the liquid in a volume restricted by the surface, the fluid handling system, and a free surface of the liquid, the free surface extending between the surface and the fluid handling system; and a heating system configured to locally heat a portion of the liquid at a receding side of a periphery edge of the volume in contact with the surface, where the object is receding from the volume along a direction of movement of the object relative to the fluid handling system.

Abstract translation: 浸没式光刻设备被配置为经由液体使基板上的感光层经受图案化的辐射束。 浸没式光刻设备包括具有表面的可移动物体，流体处理系统，用于控制在由表面限制的体积中的液体的存在，流体处理系统和液体的自由表面，自由表面在 表面和流体处理系统; 以及加热系统，其被配置为在所述体积的与所述表面接触的周边边缘的后退侧局部加热所述液体的一部分，其中所述物体沿着所述物体相对于所述流体的运动方向从所述体积退出 处理系统。