公开(公告)号：US20200097633A1

公开(公告)日：2020-03-26

申请号：US16541420

申请日：2019-08-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Sunit Sondhi MAHAJAN ,  Abraham SLACHTER ,  Brennan PETERSON ,  Koen Wilhelmus Cornelis Adrianus VAN DER STRATEN ,  Antonio CORRADI ,  Pieter Joseph Marie WÖLTGENS

IPC: G06F17/50 ,  G03F7/20

Abstract: A method for controlling a processing apparatus used in a semiconductor manufacturing process to form a structure on a substrate, the method including: obtaining a relationship between a geometric parameter of the structure and a performance characteristic of a device including the structure; and determining a process setting for the processing apparatus associated with a location on the substrate, wherein the process setting is at least partially based on an expected value of the geometric parameter of the structure when using the processing setting, a desired performance characteristic of the device and an expected physical yield margin or defect yield margin associated with the location on the substrate.

公开(公告)号：US20240319123A1

公开(公告)日：2024-09-26

申请号：US18691828

申请日：2022-08-16

Applicant: ASML Netherlands B.V.

Inventor： Achim WOESSNER ,  Younghoon SONG ,  Pioter NIKOLSKI ,  Yun A SUNG ,  Antonio CORRADI ,  Hermanus Adrianus DILLEN

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/304 ,  G01N2223/306 ,  G01N2223/401 ,  G01N2223/418 ,  G01N2223/6116 ,  G01N2223/646

Abstract: Apparatuses, systems, and methods for providing beams for classifying and identifying failure mechanisms associated with a sample of charged particle beam systems. In some embodiments, a method may include analyzing a first plurality of voltage contrast images of a sample to identify a plurality of defects; and analyzing a pattern of a subset of the plurality of defects to determine a failure mechanism for the subset of the plurality of defects.

公开(公告)号：US20230161265A1

公开(公告)日：2023-05-25

申请号：US18157776

申请日：2023-01-20

Applicant: ASML Netherlands B.V.

Inventor： Pioter NIKOLSKI ,  Thomas THEEUWES ,  Antonio CORRADI ,  Duan-Fu Stephen HSU ,  Sun Wook JUNG

IPC: G03F7/20

CPC classification number: G03F7/70525 ,  G03F7/70616 ,  G03F7/70441

Abstract: Disclosed is a method of determining a process window within a process space comprising obtaining contour data relating to features to be provided to a substrate across a plurality of layers, for each of a plurality of process conditions associated with providing the features across said plurality of layers and failure mode data describing constraints on the contour data across the plurality of layers. The failure mode data is applied to the contour data to determine a failure count for each process condition; and the process window is determined by associating each process condition to its corresponding failure count. Also disclosed is a method of determining an actuation constrained subspace of the process window based on actuation constraints imposed by the plurality of actuators.