公开(公告)号：US20150085267A1

公开(公告)日：2015-03-26

申请号：US14562133

申请日：2014-12-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Arend Johannes KISTEMAN ,  Wim Tjibbo TEL ,  Thomas THEEUWES ,  Antoine Gaston Marie KIERS

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70616 ,  G03F7/70625 ,  G03F9/7026

Abstract: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information.

Abstract translation: 一种用于确定光刻投影装置的聚焦校正的方法和相关联的装置。 该方法包括在测试基板上暴露多个全局校正场，每个全局校正场均包括多个全局校正标记，并且每个全局校正场在其上以倾斜的焦点偏移曝光; 测量所述多个全局校正标记中的每一个的聚焦依赖特性，以确定场间焦点变化信息; 以及从所述场间焦点变化信息计算场间焦点校正。