公开(公告)号：US20190064677A1

公开(公告)日：2019-02-28

申请号：US16174398

申请日：2018-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Martin Jacobus Johan Jak ,  Arie Jeffrey den Boef ,  Martin Ebert

IPC: G03F7/20 ,  G03F9/00 ,  G01B11/26 ,  G02B27/42 ,  G02B5/18 ,  G01N21/95 ,  G01N21/47 ,  G01N21/21

CPC classification number: G03F7/70191 ,  G01B11/26 ,  G01N21/21 ,  G01N21/4788 ,  G01N21/9501 ,  G02B5/1819 ,  G02B5/1823 ,  G02B27/4255 ,  G02B27/4272 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/70683 ,  G03F7/7085 ,  G03F9/7049 ,  G03F9/7076

Abstract: A method, involving illuminating at least a first periodic structure of a metrology target with a first radiation beam having a first polarization, illuminating at least a second periodic structure of the metrology target with a second radiation beam having a second different polarization, combining radiation diffracted from the first periodic structure with radiation diffracted from the second periodic structure to cause interference, detecting the combined radiation using a detector, and determining a parameter of interest from the detected combined radiation.