公开(公告)号：US20240319620A1

公开(公告)日：2024-09-26

申请号：US18650790

申请日：2024-04-30

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus TINNEMANS ,  Arie Jeffrey DEN BOEF ,  Armand Eugene Albert KOOLEN ,  Nitesh PANDEY ,  Vasco Tomas TENNER ,  Willem Marie Julia Marcel COENE ,  Patrick WARNAAR

IPC: G03F7/00 ,  G01B11/02 ,  G01B11/06 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G01B11/02 ,  G01B11/0625 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70158 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7088 ,  G01B2210/56

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US20170191944A1

公开(公告)日：2017-07-06

申请号：US15387610

申请日：2016-12-21

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Yevgeniy Konstantinovich SHMAREV ,  Stanislav SMIRNOV ,  Chien-Hung TSENG ,  Armand Eugene Albert KOOLEN

IPC: G01N21/88 ,  G01N21/95 ,  G03F7/20 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/95676 ,  G01N2201/0638 ,  G03F7/70625 ,  G03F7/70641

Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.

公开(公告)号：US20240184215A1

公开(公告)日：2024-06-06

申请号：US18286327

申请日：2022-03-23

Applicant: ASML Netherlands B.V.

Inventor： Jin LIAN ,  Armand Eugene Albert KOOLEN ,  Sebastianus Adrianus GOORDEN ,  Hui Quan LIM

IPC: G03F7/00

CPC classification number: G03F7/70516 ,  G03F7/70025 ,  G03F7/70633

Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.

公开(公告)号：US20190250094A1

公开(公告)日：2019-08-15

申请号：US16268564

申请日：2019-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Gerbrand VAN DER ZOUW ,  Arie Jeffrey DEN BOEF ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Armand Eugene Albert KOOLEN ,  Hugo Augustinus Joseph CRAMER ,  Paul Christiaan HINNEN ,  Martinus Hubertus Maria VAN WEERT ,  Anagnostis TSIATMAS ,  Shu-jin WANG ,  Bastiaan Onne FAGGINGER AUER ,  Alok VERMA

IPC: G01N21/21 ,  G01N21/88 ,  G03F7/20

CPC classification number: G01N21/21 ,  G01N21/8806 ,  G01N2021/8848 ,  G03F7/70191 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633

Abstract: An inspection apparatus, method, and system are described herein. An example inspection apparatus includes an optical system and an imaging system. The optical system may be configured to output an illumination beam incident on a target including one or more features, the illumination beam polarized with a first polarization when incident on the target. The imaging system may be configured to obtain intensity data representing at least a portion of the illumination beam scattered by the one or more features, where the portion of the illumination beam has a second polarization orthogonal to the first polarization. The inspection apparatus may be further configured to generate image data representing an image of each of the feature(s) based on the intensity data, and determine a measurement of a parameter of interest associated with the feature(s) based on an amount of the portion of the illumination beam having the second polarization.

公开(公告)号：US20180292757A1

公开(公告)日：2018-10-11

申请号：US15941324

申请日：2018-03-30

Applicant: ASML Netherlands B.V.

Inventor： Alessandro POLO ,  Nitesh PANDEY ,  Armand Eugene Albert KOOLEN

IPC: G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01N21/95 ,  G01N21/956

Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

公开(公告)号：US20180045657A1

公开(公告)日：2018-02-15

申请号：US15664808

申请日：2017-07-31

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Stanislav SMIRNOV ,  Johannes Matheus Marie DE WIT ,  Teunis Willem TUKKER ,  Armand Eugene Albert KOOLEN

IPC: G01N21/95 ,  G01N21/47

CPC classification number: G01N21/9515 ,  G01N21/47 ,  G02B21/10 ,  G02B27/0075 ,  G03F7/70616

Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.

公开(公告)号：US20170097575A1

公开(公告)日：2017-04-06

申请号：US15279860

申请日：2016-09-29

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Zili ZHOU ,  Armand Eugene Albert KOOLEN ,  Gerbrand VAN DER ZOUW

IPC: G03F7/20 ,  G01B11/27 ,  G01N21/47

CPC classification number: G03F7/70625 ,  G01B11/272 ,  G01N21/47 ,  G03F7/7015 ,  G03F7/706 ,  G03F7/70633

Abstract: Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.

公开(公告)号：US20170068173A1

公开(公告)日：2017-03-09

申请号：US15355334

申请日：2016-11-18

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan JAK ,  Armand Eugene Albert KOOLEN ,  Hendrik Jan Hidde SMILDE

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70483 ,  G03F7/70633 ,  G03F7/70683

Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.

Abstract translation: 由基板上的光刻工艺形成的测量目标包括多个分量光栅。 使用由分量光栅衍射的+1和-1次辐射来形成目标的图像。 识别检测到的图像中的感兴趣区域（ROI）对应于分量光栅。 在每个ROI内的强度值被处理并在图像之间进行比较，以获得不对称性的测量并因此获得覆盖误差。 在分量光栅之间形成分离区并设计成在图像中提供暗区。 在一个实施例中，选择其边界落入对应于分离区域的图像区域内的ROI。 通过这种措施，使不对称测量更加容忍ROI的位置的变化。 黑暗的地区也有助于识别图像中的目标。

公开(公告)号：US20250147437A1

公开(公告)日：2025-05-08

申请号：US18834171

申请日：2023-01-16

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Su-Ting CHENG ,  Hugo Augustinus Joseph CRAMER ,  Kirsten Jennifer Lyhn WANG

IPC: G03F7/00 ,  G01B11/27

Abstract: Disclosed is a method of determining a value for a parameter of interest from a target on a substrate. The method comprises obtaining metrology data comprising single-wavelength parameter of interest values which were obtained using a respective different measurement wavelength; and determining said value for the parameter of interest from a stack sensitivity derived weighted combination of said single-wavelength parameter of interest values. Also disclosed is a method of selecting wavelengths for a measurement based on at least the derivative of the stack sensitivity with respect to wavelength.

公开(公告)号：US20250138436A1

公开(公告)日：2025-05-01

申请号：US18690961

申请日：2022-08-16

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Willem Marie Julia Marcel COENE ,  Alexander Prasetya KONIJNENBERG ,  Teunis Willem TUKKER ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G06T5/10

Abstract: Disclosed is a metrology method and associated devices. The method comprises obtaining a first image, said first image being subject to one or more non-isoplanatic aberrations of an optical system used to capture said image; and non-iteratively correcting said first image for the effect of said one or more non-isoplanatic aberrations by performing one or both of: a field non-isoplanatic correction operation in field space for said first image, said field space corresponding to a field plane of the optical system; and a pupil non-isoplanatic correction operation in pupil space for said first image, said pupil space corresponding to a pupil plane of the optical system. Said one or more non-isoplanatic aberrations comprise a class of non-isoplanatic aberrations describable as a convolution combined with an object distortion and/or a pupil distortion.