公开(公告)号：US20180259855A1

公开(公告)日：2018-09-13

申请号：US15761245

申请日：2016-08-24

Applicant: ASML Netherlands B.V.

Inventor： Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP

IPC: G03F7/20

Abstract: A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body (20) having a main body surface; and a plurality of burls (21) projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature (22, 22c, 22d) configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.

公开(公告)号：US20240385535A1

公开(公告)日：2024-11-21

申请号：US18570140

申请日：2022-05-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Siegried Alexander TROMP ,  Tjarco LINDEIJER ,  Adrianus Petrus Cornelis HELLEMONS ,  Bas Johannes Petrus ROSET

IPC: G03F7/00 ,  H01L21/687

Abstract: A structure for use on a base surface of a substrate holder, wherein the structure is substantially planar with a substrate holder facing surface that is both securable to the base surface of the substrate holder and also removable from the base surface of the substrate holder, the structure having a plurality of apertures therethrough that are arranged such that a plurality of burls on the base surface may pass through the respective apertures, wherein the diameter of the apertures is in the range 50 μm to 1000 μm and the pitch between adjacent apertures is in the range 1 mm to 3 mm.

公开(公告)号：US20180308740A1

公开(公告)日：2018-10-25

申请号：US15766740

申请日：2016-09-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Satish ACHANTA ,  Tiannan GUAN ,  Raymond Wilhelmus Louis LAFARRE ,  Ilya MALAKHOVSKY ,  Bas Johannes Petrus ROSET ,  Siegfried Alexander TROMP ,  Johannes Petrus Martinus Bernardus VERMEULEN

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/68742 ,  G03F7/0002 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70733 ,  G03F7/70783 ,  H01L21/683 ,  H01L21/6831 ,  H01L21/687 ,  H01L21/6875

Abstract: A substrate table to support a substrate, the substrate table including a main body, burls extending from the main body and having first upper ends that define a support surface to support the substrate, and support pins having second upper ends. The support pins are movable between a retracted position and an extended position. The support pins are arranged to support the substrate in the extended position. The support pins are arranged to be switched to a first stiffness mode and a second stiffness mode. In the first stiffness mode, the support pins have a first stiffness in a direction parallel to the support surface. In the second stiffness mode, the support pins have a second stiffness in the direction parallel to the support surface. The first stiffness is different from the second stiffness.

公开(公告)号：US20250116944A1

公开(公告)日：2025-04-10

申请号：US18834882

申请日：2023-02-03

Applicant: ASML Netherlands B.V.

Inventor： Bas Johannes Petrus ROSET

IPC: G03F7/00 ,  G05B11/42

Abstract: A controller system is configured to control a plant and comprising a feedforward controller to provide, based on a reference state signal, a feedforward signal to the plant, and a feedback controller system to provide a feedback signal to the plant, based on a difference between the reference state signal and a plant state signal representing an actual state of the plant. The feedback controller system comprises an integrator, a trajectory generator, and a selector. The feedback controller system is configured to operate as a function of the reference state in a first control mode or a second control mode, wherein the feedback controller system, in the first control mode, operates the selector to select the trajectory generator output signal generated by the trajectory generator, and wherein the feedback controller system, in the second control mode, operates the selector to select the integrator output signal generated by the integrator.

公开(公告)号：US20220187719A1

公开(公告)日：2022-06-16

申请号：US17433897

申请日：2020-01-28

Applicant: ASML Netherlands B.V.

Inventor： Bas Johannes Petrus ROSET ,  Johannes Hendrik Everhardus MUJDERMAN ,  Benjamin Cunnegonda Henric SMEETS

IPC: G03F7/20

Abstract: The invention provides an inspection apparatus for inspecting an object, the apparatus comprising: a measurement system configured to measure: —a first parameter of the object across an area of interest of the object, and —a second parameter, different from the first parameter, of the object at a plurality of locations on the object; a stage apparatus configured to position the object relative to the measurement system during a measurement of the first parameter, wherein the measurement system is configured to measure the second parameter at the plurality of different locations during the measurement of the first parameter and wherein the stage apparatus is configured to position the object relative to the measurement system based on a compliance characteristic of the stage apparatus.