公开(公告)号：US20170363965A1

公开(公告)日：2017-12-21

申请号：US15525610

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Hans BUTLER ,  Raoul Maarten Simon KNOPS ,  Bob STREEFKERK ,  Christiaan Louis VALENTIN ,  Jan Bernard Plechelmus VAN SCHOOT ,  Wilhelmus Franciscus Johanne SIMONS ,  Leon Leonardus Franciscus MERKX ,  Robertus Johannes Marinus DE JONGH ,  Roel Johannes Elisabeth MERRY ,  Michael Frederik YPMA

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70266 ,  G03F7/705 ,  G03F7/706

Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

公开(公告)号：US20200333717A1

公开(公告)日：2020-10-22

申请号：US16763487

申请日：2018-11-07

Applicant: ASML Netherlands B.V.

Inventor： Yang-Shan HUANG ,  Pieter Cornelis Johan DE JAGER ,  Rob REILINK ,  Christiaan Louis VALENTIN ,  Jasper Leonardus Johannes SCHOLTEN ,  Antonie Hendrik VERWEIJ ,  Edwin VAN HORNE

IPC: G03F7/20 ,  F16C29/02

Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.

公开(公告)号：US20210356875A1

公开(公告)日：2021-11-18

申请号：US17282029

申请日：2019-09-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Joost DE HOOGH ,  Alain Louis Claude LEROUX ,  Alexander Marinus Arnoldus HUIJBERTS ,  Christiaan Louis VALENTIN ,  Robert Coenraad WIT ,  Dries Vaast Paul HEMSCHOOTE ,  Frits VAN DER MEULEN ,  Johannes Franciscus Martinus VAN SANTVOORT ,  Radu DONOSE

IPC: G03F7/20 ,  F25D3/10

Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.

公开(公告)号：US20180356738A1

公开(公告)日：2018-12-13

申请号：US15736297

申请日：2016-04-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Antonius Franciscus Johannes DE GROOT ,  Theo Anjes Maria RUIJL ,  Christiaan Louis VALENTIN ,  Christan WERNER

IPC: G03F7/20 ,  H01L21/68 ,  H01L21/027 ,  G03B27/58

CPC classification number: G03F7/70758 ,  G03B27/58 ,  G03F7/70725 ,  G03F7/70775 ,  H01L21/027 ,  H01L21/68

Abstract: The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.

公开(公告)号：US20190227445A1

公开(公告)日：2019-07-25

申请号：US16326948

申请日：2017-08-11

Applicant: ASML Netherlands B.V.

Inventor： Frits VAN DER MEULEN ,  Erik Johan ARLEMARK ,  Hendrikus Herman Marie COX ,  Martinus Agnes Willem CUIJPERS ,  Joost DE HOOGH ,  Gosse Charles DE VRIES ,  Paul Comé Henri DE WIT ,  Sander Catharina Reinier DERKS ,  Ronald Comelis Gerardus GIJZEN ,  Dries Vaast Paul HEMSCHOOTE ,  Christiaan Alexander HOOGENDAM ,  Adrianus Hendrik KOEVOETS ,  Raymond Wilhelmus Louis LAFARRE ,  Alain Louis Claude LEROUX ,  Patrick Willem Paul LIMPENS ,  Jim Vincent OVERKAMP ,  Christiaan Louis VALENTIN ,  Koos VAN BERKEL ,  Stan Henricus VAN DER MEULEN ,  Jacobus Comelis Gerardus VAN DER SANDEN ,  Harmen Klaas VAN DER SCHOOT ,  David Ferdinand VLES ,  Evert Auke Rinze WESTERHUIS

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.