公开(公告)号：US20250138441A1

公开(公告)日：2025-05-01

申请号：US18837353

申请日：2023-01-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Tammo UITTERDIJK ,  Ankur Ramesh BAHETI ,  Christopher SCHROECK

IPC: G03F7/00

Abstract: A system for cleaning contamination particles from a clamp of a lithography apparatus. The system includes a body configured to be inserted into the lithography apparatus, engaged by a tool handler of the lithography apparatus, and positioned by the tool handler for clamping by the clamp. Cleaning features are patterned on a clamp facing surface of the body. Locations and dimensions of the cleaning features on the clamp facing surface approximate locations and dimensions of the contamination particles on the clamp, such that relative movement between the cleaning features and the clamp cleans the contamination particles from the clamp. For example, the locations of the cleaning features on the clamp facing surface can correspond to object contact areas (e.g., burls) on the clamp where the contamination particles are located. The dimensions of the cleaning features comprise a specific pitch, a line width, and a thickness.