公开(公告)号：US20240288782A1

公开(公告)日：2024-08-29

申请号：US18289765

申请日：2022-05-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Zili ZHOU ,  Daan SWINKELS ,  Jin LIAN

IPC: G03F7/00

CPC classification number: G03F7/706849 ,  G03F7/70633 ,  G03F7/70641 ,  G03F7/706831 ,  G03F7/706837 ,  G03F7/706845 ,  G03F7/706851

Abstract: A method of measuring an overlay or focus parameter from a target and associated metrology apparatus. The method includes configuring measurement radiation to obtain a configured measurement spectrum of the measurement radiation by: imposing an intensity weighting on individual wavelength bands of the measurement radiation such that the individual wavelength bands have an intensity according to the intensity weighting, the intensity weighting being such that a measured value for the overlay or focus parameter is at least partially corrected for the effect of target imperfections; and/or imposing a modulation on a measurement spectrum of the measurement radiation. The configured measurement radiation is used to measure the target. A value for the overlay or focus parameter is determined from scattered radiation resultant from measurement of the target.