公开(公告)号：US20200348598A1

公开(公告)日：2020-11-05

申请号：US16771343

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Marleen KOOIMAN ,  David Marie RIO ,  Sander Frederik WUISTER

IPC: G03F7/20 ,  G06F30/13

Abstract: A method for calibrating a resist model. The method includes: generating a modeled resist contour of a resist structure based on a simulated aerial image of the resist structure and parameters of the resist model, and predicting a metrology contour of the resist structure from the modeled resist contour based on information of an actual resist structure obtained by a metrology device. The method includes adjusting one or more of the parameters of the resist model based on a comparison of the predicted metrology contour and an actual metrology contour of the actual resist structure obtained by the metrology device.