公开(公告)号：US20170237225A1

公开(公告)日：2017-08-17

申请号：US15502462

申请日：2015-07-27

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Teis Johan COENEN ,  Jeroen Johannes Michiel VAN HELVOORT ,  Wouter Joep ENGELEN ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Gijsbertus Geert POORTER ,  Erik Roelof LOOPSTRA

IPC: H01S4/00 ,  H05H7/02 ,  H05H9/00

CPC classification number: H01S3/0903 ,  H01S3/0071 ,  H01S3/0959 ,  H01S3/1024 ,  H01S3/11 ,  H01S3/1103

Abstract: Passage through LINACs of electron bunches in their acceleration phase is coordinated with passage through the LINACs of electron bunches in their deceleration phase. Each successive pair of electron bunches are spaced in time by a respective bunch spacing, in accordance with a repeating electron bunch sequence. The electron source provides clearing gaps in the electron bunch sequence to allow clearing of ions at the undulator. The electron source provides the clearing gaps in accordance with a clearing gap sequence such that, for each of the plurality of energy recovery LINACS, and for substantially all of the clearing gaps: for each passage of the clearing gap through the LINAC in an acceleration phase or deceleration phase the clearing gap is coordinated with a further one of the clearing gaps passing through the LINAC in a deceleration phase or acceleration phase thereby to maintain energy recovery operation of the LINAC.

公开(公告)号：US20220326152A1

公开(公告)日：2022-10-13

申请号：US17639845

申请日：2020-09-04

Applicant: ASML Netherlands B.V.

Inventor： Adrianus Johannes Hendrikus SCHELLEKENS ,  David O'DWYER ,  Nan LIN ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G01N21/47 ,  G02F1/35 ,  G03F7/20

Abstract: A high harmonic generation assembly and method for generating high harmonic radiation. The assembly comprises a cavity configured to receive input radiation and increase the intensity of the input radiation inside the cavity for forming drive radiation suitable for use in high harmonic generation. The assembly further comprises an interaction region within the cavity at which, in use, a medium is present, the medium being configured to generate harmonic radiation by high harmonic generation when the drive radiation is incident thereupon, and an optical assembly configured to direct the drive radiation to pass through the interaction region, and comprising an output coupler comprising an aperture through which at least a part of the generated harmonic radiation is able to exit the cavity. The optical assembly is further configured to shape the drive radiation into a converging hollow beam before the drive radiation passes through the interaction region.

公开(公告)号：US20190204757A1

公开(公告)日：2019-07-04

申请号：US16233707

申请日：2018-12-27

Applicant: ASML Netherlands B.V.

Inventor： Gerrit Jacobus Hendrik BRUSSAARD ,  Petrus Wilhelmus Smorenburg ,  Teis Johan Coenen ,  Niels Geypen ,  Peter Danny Van Voorst ,  Sander Bas Roobol

IPC: G03F7/20

Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.

公开(公告)号：US20190035594A1

公开(公告)日：2019-01-31

申请号：US16072385

申请日：2017-02-07

Applicant: ASML Netherlands B.V.

Inventor： Andrey Alexandrovich NIKIPELOV ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Wouter Joep ENGELEN

IPC: H01J37/073 ,  H01S3/09

CPC classification number: H01J37/073 ,  H01J2237/063 ,  H01S3/0903 ,  H05H2007/084

Abstract: An electron source, e.g. for a free electron laser used for EUV lithography comprises: a cathode (203) configured to be connected to a negative potential (100, 101); a laser (110) configured to direct pulses of radiation onto the cathode so as to cause the cathode to emit bunches of electrons; an RF booster (180) connected to an RF source and configured to accelerate the bunches of electrons; and a timing corrector (303, 313, 400, 401) configured to correct the time of arrival of bunches of electrons at the RF booster relative to the RF voltage provided by the RF source. The timing corrector may comprise a correction electrode (303, 313) surrounding a path of the bunches of electrons from the cathode to the RF booster and a correction voltage source (400, 401) configured to apply a correction voltage to the correction electrode.

公开(公告)号：US20230194954A1

公开(公告)日：2023-06-22

申请号：US18072196

申请日：2022-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Gerrit Jacobus Hendrik BRUSSAARD ,  Johannes Richard Karl KOHLER

IPC: G02F1/365 ,  G02F1/35

CPC classification number: G02F1/365 ,  G02F1/3528

Abstract: A waveguide including: a first section, the first section configured to generate, by a non-linear optical process, a broadened wavelength spectrum of pulsed radiation provided to an input end of the waveguide; a second section, the second section including an output end of the waveguide, the second section configured to exhibit a larger absolute value of group velocity dispersion than the first section; wherein a length of the second section is configured to reduce a peak intensity of one or more peaks in the broadened wavelength spectrum by at least 20%.

公开(公告)号：US20210191274A1

公开(公告)日：2021-06-24

申请号：US17055410

申请日：2019-04-23

Applicant: ASML Netherlands B.V.

Inventor： David O DWYER ,  Petrus Wilhelmus SMORENBURG ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G03F7/20 ,  G02B5/00

Abstract: An illumination source apparatus (500), suitable for use in a metrology apparatus for the characterization of a structure on a substrate, the illumination source apparatus comprising: a high harmonic generation, HHG, medium (502); a pump radiation source (506) operable to emit a beam of pump radiation (508); and adjustable transformation optics (510) configured to adjustably transform the transverse spatial profile of the beam of pump radiation to produce a transformed beam (518) such that relative to the centre axis of the transformed beam, a central region of the transformed beam has substantially zero intensity and an outer region which is radially outwards from the centre axis of the transformed beam has a non-zero intensity, wherein the transformed beam is arranged to excite the HHG medium so as to generate high harmonic radiation (540), wherein the location of said outer region is dependent on an adjustment N setting of the adjustable transformation optics.

公开(公告)号：US20180267411A1

公开(公告)日：2018-09-20

申请号：US15903392

申请日：2018-02-23

Applicant: ASML Netherlands B.V.

Inventor： Sudhir SRIVASTAVA ,  Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nan LIN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Krijn Frederik BUSTRAAN ,  Petrus Wilhelmus SMORENBURG ,  Gerrit Jacobus Hendrik BRUSSAARD

IPC: G03F7/20

Abstract: Disclosed is gas delivery system which is suitable for a high harmonic generation (HHG) radiation source which may be used to generate measurement radiation for an inspection apparatus. In such a radiation source, a gas delivery element delivers gas in a first direction. The gas delivery element has an optical input and an optical input, defining an optical path running in a second direction. The first direction is arranged relative to the second direction at an angle that is not perpendicular or parallel. Also disclosed is a gas delivery element having a gas jet shaping device, or a pair of gas delivery elements, one of which delivers a second gas, such that the gas jet shaping device or second gas is operable to modify a flow profile of the gas such that the number density of the gas falls sharply.

公开(公告)号：US20180058928A1

公开(公告)日：2018-03-01

申请号：US15549133

申请日：2016-02-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Vadim Yevgenyevich BANINE ,  Gerrit Jacobus Hendrik BRUSSAARD ,  Willem Jakobus Cornelis KOPPERT ,  Otger Jan LUITEN ,  Han-Kwang NIENHUYS ,  Job BECKERS ,  Ruud Martinus VAN DER HORST

IPC: G01J1/58 ,  G01J1/42 ,  G03F7/20 ,  H01S3/13 ,  G01T1/20

Abstract: A radiation sensor apparatus for determining a position and/or power of a radiation beam, the radiation sensor apparatus including a chamber to contain a gas, one or more sensors, and a processor. The chamber has a first opening and a second opening such that a radiation beam can enter the chamber through the first opening, propagate through the chamber generally along an axis, and exit the chamber through the second opening. Each of the one or more sensors is arranged to receive and detect radiation emitted from a region of the chamber around the axis. The processor is operable to use the radiation detected by the one or more sensors to determine a position and/or power of the radiation beam.