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1.发明授权Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method 有权标记位置测量装置和方法，光刻设备和装置制造方法公开(公告)号：US09551939B2
公开(公告)日：2017-01-24
申请号：US14428565
申请日：2013-09-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
CPC classification number: G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导到装置的光瞳上的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 使用由照射装置提供的辐射在扫描方向上扫描横过标记的辐射来将辐射引导到标记上的目的; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。
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公开(公告)号：US20180067401A1
公开(公告)日：2018-03-08
申请号：US15682135
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US09740106B2
公开(公告)日：2017-08-22
申请号：US14931560
申请日：2015-11-03
Applicant: ASML Netherlands B.V.
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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Patent Agency Ranking
4.发明授权Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method 有权位置测量装置，位置测量方法，光刻设备和装置制造方法公开(公告)号：US09506743B2
公开(公告)日：2016-11-29
申请号：US14427287
申请日：2013-09-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen , Gerrit Johannes Nijmeijer , J. Christian Swindal , Patricius Aloysius Jacobus Tinnemans , Richard Johannes Franciscus Van Haren
CPC classification number: G01B11/002 , G03F7/70775 , G03F9/7003 , G03F9/7049 , G03F9/7088 , H01L22/12
Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。
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5.发明申请MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权标记位置测量装置和方法，光刻装置和装置制造方法公开(公告)号：US20150234290A1
公开(公告)日：2015-08-20
申请号：US14428565
申请日：2013-09-23
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Gijsbert Josephus Mathijssen , Arie Jeffrey Den Boef , Stanley Drazkiewicz , Justin Lloyd Kreuzer , Gerrit Johannes Nijmeijer
CPC classification number: G03F7/70141 , G01B11/14 , G03F9/7069 , G03F9/7088
Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
Abstract translation: 一种用于测量标记位置的装置，该装置包括用于将辐射引导到装置的光瞳上的照明装置，所述照明装置包括照明源，以提供基本上相等偏振的多波长辐射和波片，以改变 依赖于波长的辐射的极化，使得提供不同极化的辐射; 使用由照射装置提供的辐射在扫描方向上扫描横过标记的辐射来将辐射引导到标记上的目的; 辐射处理元件，用于处理由所述标记衍射并由所述物镜接收的辐射; 以及检测装置，用于检测在扫描期间由辐射处理元件输出的辐射强度的变化，并且根据检测到的变化来计算至少第一测量方向上的标记的位置。
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公开(公告)号：US10345711B2
公开(公告)日：2019-07-09
申请号：US15682135
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US09182222B2
公开(公告)日：2015-11-10
申请号：US13672539
申请日：2012-11-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
Abstract translation: 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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8.发明申请POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权位置测量装置，位置测量方法，平面设备和装置制造方法公开(公告)号：US20150219438A1
公开(公告)日：2015-08-06
申请号：US14427287
申请日：2013-09-20
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Arie Jeffrey Den Boef , Justin Lloyd Kreuzer , Simon Gijsbert Josephus Mathijssen , Gerrit Johannes Nijmeijer , J. Christian Swindal , Patricius Aloysius Jacobus Tinnemans , Richard Johannes Franciscus Van Haren
CPC classification number: G01B11/002 , G03F7/70775 , G03F9/7003 , G03F9/7049 , G03F9/7088 , H01L22/12
Abstract: An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom.
Abstract translation: 一种用于测量标记位置的装置，该装置包括使用由照明装置提供的辐射将辐射引导到标记上的物镜; 接收由标记衍射并被镜面反射的辐射的光学装置，其中所述光学装置被配置为提供第一图像和第二图像，所述第一图像通过相干地添加镜面反射辐射和正衍射级辐射而形成，并且所述第二图像 通过相干地加入镜面反射辐射和负衍射级辐射形成; 以及检测装置，用于检测第一和第二图像的辐射强度的变化，并计算标记在测量方向上的位置。
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