公开(公告)号：US20170199467A1

公开(公告)日：2017-07-13

申请号：US15321184

申请日：2015-06-04

Applicant: ASML NETHERLANDS B.V.

Inventor： Sander KERSSEMAKERS ,  Wilhelmus Petrus DE BOEIJ ,  Gerben Frank DE LANGE ,  Christiaan Alexander HOOGENDAM ,  Petrus Franciscus VAN GILS ,  Jelmer Mattheus KAMMINGA ,  Jan Jaap KUIT ,  Carolus Johannes Catharina SCHOORMANS

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70716

Abstract: A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.