公开(公告)号：WO2017198422A1

公开(公告)日：2017-11-23

申请号：PCT/EP2017/059642

申请日：2017-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： GARCIA GRANDA, Miguel ,  LEEWIS, Christian, Marinus ,  STAALS, Frank

IPC: G03F9/00 ,  G03F7/20

Abstract: A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter comprises determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.

Abstract translation: 一种方法，包括：通过使用衬底测量配方从衬底上的目标获得测量结果; 由硬件计算机系统从所述测量结果确定参数，其中所述参数表征所述测量结果对用于所述衬底测量配方中的入射辐射的所述目标的光路长度的依赖性，并且确定所述参数包括确定 关于入射辐射的波长的相对变化的测量结果; 如果参数不在指定范围内，请调整基材测量配方。