公开(公告)号：US20190129319A1

公开(公告)日：2019-05-02

申请号：US16096360

申请日：2017-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Miguel GARCIA GRANDA ,  LEEWIS Marinus Christian ,  Frank STAALS

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F7/705 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03F9/7019 ,  G03F9/7026 ,  G03F9/7046 ,  G03F9/7092

Abstract: A method including obtaining a measurement result from a target on a substrate, by using a substrate measurement recipe; determining, by a hardware computer system, a parameter from the measurement result, wherein the parameter characterizes dependence of the measurement result on an optical path length of the target for incident radiation used in the substrate measurement recipe and the determining the parameter includes determining dependence of the measurement result on a relative change of wavelength of the incident radiation; and if the parameter is not within a specified range, adjusting the substrate measurement recipe.