公开(公告)号：WO2020212068A1

公开(公告)日：2020-10-22

申请号：PCT/EP2020/057687

申请日：2020-03-19

Applicant: ASML NETHERLANDS B.V.

Inventor： HAUPTMANN, Marc ,  ISMAIL, Amir, Bin ,  RAHMAN, Rizvi ,  LI, Jiapeng

IPC: G03F7/20 ,  G05B19/418 ,  H01L21/66

Abstract: There is disclosed a method for generating a sampling scheme for a device manufacturing process, the method comprising: obtaining a measurement data time series of a plurality of processed substrates; transforming the measurement data time series to obtain frequency domain data; determining, using the frequency domain data, a temporal sampling scheme; determining an error offset introduced by the temporal sampling scheme on the basis of measurements on substrates performed according to the temporal sampling scheme; and determining an improved temporal sampling scheme to compensate said error offset.