公开(公告)号：WO2021104791A1

公开(公告)日：2021-06-03

申请号：PCT/EP2020/080408

申请日：2020-10-29

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN HAL, Paulus, Albertus ,  MILLO, Diego ,  ZDRAVKOV, Aleksandar, Nikolov ,  VAN DE KERKHOF, Marcus, Adrianus

IPC: G03F7/20 ,  H01L21/687

Abstract: The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.