公开(公告)号：US20250147440A1

公开(公告)日：2025-05-08

申请号：US18835714

申请日：2023-01-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Zomer Silvester HOUWELING ,  Roman PUSHKAREV ,  Robbert Wilhelmus Elisabeth VAN DE KRUIJS ,  Marcel David ACKERMANN

IPC: G03F7/00 ,  G03F1/64

Abstract: Novel membranes for use in a lithographic apparatus are disclosed. A first membrane includes a core substrate and a metal silicate layer. The metal silicate layer is an outermost layer of the first membrane. A second membrane includes a core substrate and an yttrium silicate layer. The yttrium silicate layer may be an outermost layer of the membrane or, alternatively, the yttrium silicate layer may be disposed between the core substrate and a layer of yttrium or yttrium oxide. The first and second membranes may be provided within an EUV lithographic apparatus. For example, the membranes may form part of a pellicle. The pellicle may be suitable for use adjacent to a reticle within an EUV lithographic apparatus. The membranes may form part of a dynamic gas lock. The membranes may form part of a spectral filter.