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公开(公告)号：US11372343B2
公开(公告)日：2022-06-28
申请号：US17435115
申请日：2020-02-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Henricus Martinus Johannes Van De Groes , Johannes Hubertus Antonius Van De Rijdt , Marcel Pieter Jacobus Peeters , Chien-Hung Tseng , Henricus Petrus Maria Pellemans
IPC: G03F9/00
Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.
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