公开(公告)号：US10345723B2

公开(公告)日：2019-07-09

申请号：US16072218

申请日：2017-02-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Johannes Vervoordeldonk ,  Joeri Lof

IPC: G03F7/20 ,  G03F9/00 ,  B65G47/24

Abstract: A substrate handling system for handling a substrate, the substrate handling system including a holder for holding the substrate, a rotation device for rotating the holder around an axis perpendicular to a plane, and a mover for moving the holder along a path in the plane relative to the axis. Further, there is provided a lithographic apparatus including the substrate handling system. The substrate handling system may include a coupling device arranged to couple the holder to the mover or the rotation device in a first situation. The coupling device may be arranged to decouple the holder from the mover or rotation device in a second situation.