公开(公告)号：WO2014009100A1

公开(公告)日：2014-01-16

申请号：PCT/EP2013/062361

申请日：2013-06-14

Applicant: ASML NETHERLANDS B.V.

Inventor： DANILIN, Alexander, Alexandrovich ,  ARRIZABALAGA, Alejandro ,  MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/70516 ,  G03F7/70725

Abstract: A A method of calibrating a substrate positioning system of a lithographic apparatus, the method including: exposing a pattern with the lithographic apparatus on an exposed layer on the surface of a substrate having a reference layer, wherein the pattern corresponds to a movement of the substrate by the substrate positioning system; measuring overlay data between the exposed layer and the reference layer on a plurality of positions on the substrate; transforming the overlay data from a spatial domain to a frequency domain by a discrete cosine transformation; modifying the overlay data in the frequency domain by selecting a subset of the overlay data; transforming the modified overlay data from the frequency domain back to the spatial domain by an inverse discrete cosine transformation; calibrating the substrate positioning system by using the modified overlay data in the spatial domain.

Abstract translation: AA方法，其校准光刻设备的衬底定位系统，所述方法包括：在具有参考层的衬底的表面上的暴露层上暴露具有光刻设备的图案，其中所述图案对应于所述衬底的移动 基板定位系统; 在所述衬底上的多个位置上测量所述暴露层和所述参考层之间的覆盖数据; 通过离散余弦变换将叠加数据从空间域变换到频域; 通过选择覆盖数据的子集来修改频域中的覆盖数据; 通过反相离散余弦变换将经修改的覆盖数据从频域转换回空间域; 通过使用空间域中的修改的覆盖数据来校准衬底定位系统。

公开(公告)号：WO2011101187A1

公开(公告)日：2011-08-25

申请号：PCT/EP2011/050438

申请日：2011-01-14

Applicant: ASML Netherlands B.V. ,  PADIY, Alexandre, Viktorovych ,  MENCHTCHIKOV, Boris

Inventor： PADIY, Alexandre, Viktorovych ,  MENCHTCHIKOV, Boris

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70616 ,  G03F7/70516 ,  G03F7/70525 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7046

Abstract: A method controls a scanning function of a lithographic apparatus. A first alignment strategy is used. A monitor wafer is exposed to determine baseline control parameters pertaining to the scanning function. The baseline control parameters are periodically retrieved from the monitor wafer. Parameter drift is determined from the baseline control parameters. Corrective action is taken based on the determination. A production wafer is exposed using a second alignment strategy, different to the first alignment strategy. The corrective action is modified so as to be substantially closer to the correction that would have been made had the second alignment strategy been used in exposing the monitor wafer.

Abstract translation: 方法控制光刻设备的扫描功能。 使用第一对齐策略。 暴露监视器晶片以确定与扫描功能有关的基线控制参数。 从监视器晶片周期性地检索基线控制参数。 参数漂移由基线控制参数决定。 根据确定采取纠正措施。 使用与第一对准策略不同的第二对准策略来曝光生产晶片。 校正动作被修改，以便基本上更接近如果在暴露监视器晶片时已经使用第二对准策略将会进行的校正。

公开(公告)号：WO2011101184A1

公开(公告)日：2011-08-25

申请号：PCT/EP2011/050379

申请日：2011-01-13

Applicant: ASML NETHERLANDS B.V. ,  PADIY, Alexandre, Viktorovych ,  MENCHTCHIKOV, Boris

Inventor： PADIY, Alexandre, Viktorovych ,  MENCHTCHIKOV, Boris

IPC: G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70616 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: A method produces at least one monitor wafer for a lithographic apparatus. The monitor wafer is for use in combination with a scanning control module to periodically retrieve measurements defining a baseline from the monitor wafer thereby determining parameter drift from the baseline. In doing this, allowance and/or correction can be to be made for the drift. The baseline is determined by initially exposing the monitor wafer(s) using the lithographic apparatus, such that the initial exposure is performed while using non-standard alignment model settings optimized for accuracy, such as those used for testing the apparatus. An associated lithographic apparatus is also disclosed.

Abstract translation: 一种方法产生用于光刻设备的至少一个监视晶片。 监视器晶片与扫描控制模块组合使用，以周期性地从监视器晶片检索定义基线的测量结果，从而确定基线的参数漂移。 在这样做时，可以对漂移进行津贴和/或修正。 通过使用光刻设备初始暴露监视器晶片来确定基线，使得在使用针对精度优化的非标准对准模型设置（诸如用于测试设备的那些）时执行初始曝光。 还公开了一种相关的光刻设备。

公开(公告)号：WO2011101183A1

公开(公告)日：2011-08-25

申请号：PCT/EP2011/050324

申请日：2011-01-12

Applicant: ASML Netherlands B.V. ,  MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

Inventor： MENCHTCHIKOV, Boris ,  PADIY, Alexandre, Viktorovych

IPC: G03F7/20

CPC classification number: G03F7/70258 ,  G03F7/70616

Abstract: A lithographic apparatus operates by moving a substrate and a patterning device relative to each other in a sequence of movements such that a pattern is applied at a successive portions on the substrate. Each portion of the substrate is patterned by a scanning operation in which the patterning device is scanned through the radiation beam while synchronously scanning the substrate through the patterned radiation beam so as to apply the pattern to the desired portion on the substrate. An intrafield correction is applied during each scanning operation so as to compensate for distortion effects which vary during the scanning operation. The intrafield correction includes corrective variations of one or more properties of the projection system, and optionally out-of-plane movements of the patterning device and/or substrate table.

Abstract translation: 平版印刷设备通过以一系列运动相对于彼此移动基板和图案形成装置来操作，使得在基板上的连续部分施加图案。 通过扫描操作来对衬底的每个部分进行构图，其中图案形成装置通过辐射束扫描，同时通过图案化的辐射束同步扫描衬底，以将图案施加到衬底上的期望部分。 在每次扫描操作期间应用场内校正，以补偿在扫描操作期间变化的失真效应。 场内校正包括投影系统的一个或多个特性的校正变化，以及图案形成装置和/或衬底台的任意的平面外运动。