公开(公告)号：US20230236518A1

公开(公告)日：2023-07-27

申请号：US18008283

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML HOLDING N.V.

Inventor： Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN ,  Koos VAN BERKEL ,  Marcus Adrianus VAN DE KERKHOF ,  Roger Franciscus Mattheus Maria HAMELINCK ,  Shahab SHERVIN ,  Marinus Augustinus Christiaan VERSCHUREN ,  Johannes Bernardus Charles ENGELEN ,  Matthias KRUIZINGA ,  Tammo UITTERDIJK ,  Oleksiy Sergiyovich GALAKTIONOV ,  Kjeld Gertrudus Hendrikus JANSSEN ,  Johannes Adrianus Cornelis Maria PIJNENBURG ,  Peter VAN DELFT

IPC: G03F7/00

CPC classification number: G03F7/70825 ,  G03F7/70708

Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.

公开(公告)号：US20160231655A1

公开(公告)日：2016-08-11

申请号：US15131986

申请日：2016-04-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG ,  Peter VAN DELFT

IPC: G03F7/20 ,  B05D1/00

CPC classification number: G03F7/70716 ,  B05D1/005 ,  G03F7/70341 ,  G03F7/70691 ,  G03F7/707

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The planarization layer is of substantially uniform thickness and/or its outer surface has a peak to valley distance of less than 10 μm. The planarization layer may be formed by applying two solutions of different concentration. A surface treatment may be applied to the burls to repel a solution of the planarization layer material.

Abstract translation: 用于光刻设备的衬底保持器具有设置在其表面上的平坦化层。 平坦化层为形成电子部件的薄膜叠层的形成提供光滑的表面。 平坦化层具有基本均匀的厚度和/或其外表面具有小于10μm的峰谷距离。 可以通过施加不同浓度的两种溶液来形成平坦化层。 表面处理可以施加到毛圈以排斥平坦化层材料的溶液。