公开(公告)号：US20160370716A1

公开(公告)日：2016-12-22

申请号：US15121719

申请日：2015-03-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Joeri LOF ,  Joost KAUFFMAN ,  Martin Dieter Nico PETERS ,  Petrus Theodorus RUTGERS ,  Martijn Hendrikus Wilhelmus STOPEL ,  Gerard VAN DEN EIJKEL ,  Harmen Klaas VAN DER SCHOOT ,  Raimond VISSER

IPC: G03F7/20 ,  H01L21/66 ,  H01L21/687 ,  G01B11/27 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G01B11/272 ,  G03F7/7075 ,  G03F9/7011 ,  H01L21/681 ,  H01L21/682 ,  H01L21/68707 ,  H01L22/12

Abstract: A sensor system configured to determine a position of a substrate having an edge. The sensor system includes a radiation source arranged to emit a radiation bundle, a reflective element, a detector device and a substrate table having a supporting surface for supporting the substrate. The supporting surface is at least partly along a plane. The radiation source and the detector device are arranged on a first side of the plane. The reflective element is arranged on a second side of the plane other than the first side. The reflective element is arranged to create a reflected bundle by reflecting the radiation bundle. The reflective element is arranged to illuminate the edge with the reflected bundle. The detector device is arranged to receive the reflected bundle.

Abstract translation: 一种被配置为确定具有边缘的基底的位置的传感器系统。 传感器系统包括布置成发射辐射束的辐射源，反射元件，检测器装置和具有用于支撑衬底的支撑表面的衬底台。 支撑表面至少部分地沿着平面。 辐射源和检测器装置布置在平面的第一侧上。 反射元件布置在除了第一侧之外的平面的第二侧上。 反射元件布置成通过反射辐射束来产生反射束。 反射元件布置成用反射束照射边缘。 检测器装置被布置成接收反射束。

公开(公告)号：US20210373446A1

公开(公告)日：2021-12-02

申请号：US16763925

申请日：2018-10-08

Applicant: ASML Netherlands B.V.

Inventor： Yang-Shan HUANG ,  Petrus Theodorus RUTGERS

IPC: G03F7/20 ,  H02K41/03 ,  H02K21/44

Abstract: A method for positioning a substage (9), supported by a main stage (5), relative to a reference object, the substage moveable in a direction (7) between a first and second position relative to the main stage. The method includes positioning the first stage using a passive force system that is activated by positioning the main stage. The passive force system includes two magnet systems (119, 121), each magnet system being configured to apply a force in the direction to the first stage with respect to the second stage in a non-contact manner, the forces resulting in a resultant force applied to the first stage in the direction by the passive force system. A magnitude and/or a direction of the resultant force depends on the position of the first stage relative to the second stage, and the first stage has a zero-force position between the first and second position in which the resultant force is zero.