公开(公告)号：US20230334217A1

公开(公告)日：2023-10-19

申请号：US18206029

申请日：2023-06-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Chrysostomos BATISTAKIS ,  Roger Josef Maria JEURISSEN ,  Koen Gerhardus WINKELS

IPC: G03F7/20 ,  G06F30/3308 ,  G06F30/398 ,  G06F30/28

CPC classification number: G06F30/398 ,  G03F7/705 ,  G06F30/28 ,  G06F30/3308 ,  G03F7/70625 ,  G06F2119/18

Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.

公开(公告)号：US20220075275A1

公开(公告)日：2022-03-10

申请号：US17416314

申请日：2019-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Chrysostomos BATISTAKIS ,  Roger Josef Maria JEURISSEN ,  Koen Gerhardus WINKELS

IPC: G03F7/20 ,  G06F30/392

Abstract: A method for determining a deformation of a resist in a patterning process. The method involves obtaining a resist deformation model of a resist having a pattern, the resist deformation model configured to simulate a fluid flow of the resist due to capillary forces acting on a contour of at least one feature of the pattern; and determining, via the resist deformation model, a deformation of a resist pattern to be developed based on an input pattern to the resist deformation model.