公开(公告)号：US20160035605A1

公开(公告)日：2016-02-04

申请号：US14775237

申请日：2014-03-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Roger Wilhelmus Antonius Henricus SCHMITZ ,  Sander Catharina Reinier DERKS ,  Leon Martin LEVASIER

IPC: H01L21/67 ,  G05D23/19 ,  G05B15/02 ,  H01L21/687 ,  H01L21/66

CPC classification number: H01L21/67248 ,  G03F7/70875 ,  G05B15/02 ,  G05D23/1917 ,  H01L21/67069 ,  H01L21/68785 ,  H01L22/12

Abstract: Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure.

Abstract translation: 公开了用于保持基板或图案形成装置的支撑结构装置，例如在光刻设备中，以及包括这种支撑结构装置的装置。 支撑结构装置包括用于控制支撑结构的温度的温度调节系统和位于所述支撑结构的周边上的一个或多个温度传感器，其可操作以测量所述外围处的支撑结构的温度。 温度调节系统可以用于根据由所述温度传感器测量的温度值和与位置相关的相关因素来计算衬底保持器的平均温度，这取决于施加的热负荷在安装在支撑件上的衬底或图案形成装置上的位置 结构体。