公开(公告)号：WO2021037509A1

公开(公告)日：2021-03-04

申请号：PCT/EP2020/072063

申请日：2020-08-05

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： SWILLAM, Mohamed ,  ROUX, Stephen ,  ELAZHARY, Tamer, Mohamed, Tawfik, Ahmed, Mohamed ,  DEN BOEF, Arie, Jeffrey

IPC: G03F7/20 ,  H01L31/0232 ,  G02B6/42

Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

公开(公告)号：WO2023016773A1

公开(公告)日：2023-02-16

申请号：PCT/EP2022/070554

申请日：2022-07-21

Applicant: ASML NETHERLANDS B.V.

Inventor： SWILLAM, Mohamed ,  ROUX, Stephen ,  KREUZER, Justin, Lloyd ,  REZVANI NARAGHI, Roxana

IPC: G03F9/00

Abstract: Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the region. The example method can further include illuminating the region with a second radiation beam at a second incident angle and, in response, measuring a second set of photons diffracted from the region. The example method can further include generating measurement data for the region based on the measured first set of photons and the measured second set of photons.

公开(公告)号：WO2021239479A1

公开(公告)日：2021-12-02

申请号：PCT/EP2021/062894

申请日：2021-05-14

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： GOORDEN, Sebastianus, Adrianus ,  ALPEGGIANI, Filippo ,  HUISMAN, Simon, Reinald ,  BASELMANS, Johannes, Jacobus, Matheus ,  KOK, Haico, Victor ,  SWILLAM, Mohamed ,  BEUKMAN, Arjan, Johannes, Anton

IPC: G03F7/20

Abstract: A metrology system includes a radiation source, first, second, and third optical systems, and a processor. The first optical system splits the radiation into first and second beams of radiation and impart one or more phase differences between the first and second beams. The second optical system directs the first and second beams toward a target structure to produce first and second scattered beams of radiation. The third optical system interferes the first and second scattered beams at an imaging detector. The imaging detector generates a detection signal based on the interfered first and second scattered beams. The metrology system modulates one or more phase differences of the first and second scattered beams based on the imparted one or more phase differences. The processor analyzes the detection signal to determine a property of the target structure based on at least the modulated one or more phase differences.

公开(公告)号：WO2021259646A1

公开(公告)日：2021-12-30

申请号：PCT/EP2021/065540

申请日：2021-06-09

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN WEPEREN, Ilse ,  BEUKMAN, Arjan, Johannes, Anton ,  SWILLAM, Mohamed ,  KREUZER, Justin, Lloyd ,  ROUX, Stephen

IPC: G01N21/95 ,  G01N21/956 ,  G03F1/84 ,  G01N2021/95676

Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

公开(公告)号：WO2021259618A1

公开(公告)日：2021-12-30

申请号：PCT/EP2021/065078

申请日：2021-06-04

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： SWILLAM, Mohamed ,  REIJNDERS, Marinus, Petrus

IPC: G03F9/00 ,  G03F7/20 ,  G02B6/293 ,  G02B6/04 ,  G02B6/122 ,  G03F7/70616 ,  G03F7/70633 ,  G03F9/7065 ,  G03F9/7088

Abstract: A system includes an illumination system, an optical element, a switching element and a detector. The illumination system includes a broadband light source that generates a beam of radiation. The dispersive optical element receives the beam of radiation and generates a plurality of light beams having a narrower bandwidth than the broadband light source. The optical switch receives the plurality of light 5 beams and transmits each one of the plurality of light beams to a respective one of a plurality of alignment sensor of a sensor array. The detector receives radiation returning from the sensor array and to generate a measurement signal based on the received radiation.

公开(公告)号：WO2021110416A1

公开(公告)日：2021-06-10

申请号：PCT/EP2020/082575

申请日：2020-11-18

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： SWILLAM, Mohamed ,  HUISMAN, Simon, Reinald ,  KREUZER, Justin, Lloyd

IPC: G03F7/20 ,  G03F9/00

Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.

公开(公告)号：WO2021058338A1

公开(公告)日：2021-04-01

申请号：PCT/EP2020/075785

申请日：2020-09-15

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： SETIJA, Irwan, Dani ,  DEN BOEF, Arie, Jeffrey ,  SWILLAM, Mohamed ,  BEUKMAN, Arjan, Johannes, Anton

IPC: G02F1/295 ,  G02B27/48 ,  G03F7/20

Abstract: A system includes a radiation source and a phased array. The phased array includes optical elements, waveguides and phase modulators. The phased array generates a beam of radiation. The optical elements radiate radiation waves. The waveguides guide radiation from the radiation source to the optical elements. The phase modulators adjust phases of the radiation waves such that the radiation waves accumulate to form the beam. An amount of incoherence of the beam is based on randomization of the phases.