公开(公告)号：US10656534B2

公开(公告)日：2020-05-19

申请号：US16428215

申请日：2019-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitesh Pandey ,  Jin Lian ,  Samee Ur-Rehman ,  Martin Jacobus Johan Jak

IPC: G01B11/02 ,  G03F7/20

Abstract: Methods and apparatuses for measuring a plurality of structures formed on a substrate are disclosed. In one arrangement, a method includes obtaining data from a first measurement process. The first measurement process including individually measuring each of the plurality of structures to measure a first property of the structure. A second measurement process is used to measure a second property of each of the plurality of structures. The second measurement process includes illuminating each structure with radiation having a radiation property that is individually selected for that structure using the measured first property for the structure.