公开(公告)号：US12013647B2

公开(公告)日：2024-06-18

申请号：US17419648

申请日：2019-12-24

Applicant: ASML Netherlands B.V.

Inventor： Simon Gijsbert Josephus Mathijssen ,  Marc Johannes Noot ,  Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Grzegorz Grzela ,  Timothy Dugan Davis ,  Olger Victor Zwier ,  Ralph Timotheus Huijgen ,  Peter David Engblom ,  Jan-Willem Gemmink

IPC: G03F7/00 ,  G01N21/47 ,  G06T7/00

CPC classification number: G03F7/70633 ,  G01N21/47 ,  G06T7/0004 ,  G01N2021/4735 ,  G06T2207/30148

Abstract: A method provides the steps of receiving an image from a metrology tool, determining individual units of said image and discriminating the units which provide accurate metrology values. The images are obtained by measuring the metrology target at multiple wavelengths. The discrimination between the units, when these units are pixels in said image, is based on calculating a degree of similarity between said units.

公开(公告)号：US11703772B2

公开(公告)日：2023-07-18

申请号：US17124758

申请日：2020-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/00 ,  G01B11/27

CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US10908513B2

公开(公告)日：2021-02-02

申请号：US16026507

申请日：2018-07-03

Applicant: ASML Netherlands B.V.

Inventor： Marc Johannes Noot ,  Simon Gijsbert Josephus Mathijssen ,  Kaustuve Bhattacharyya ,  Jinmoo Byun ,  Hyun-Su Kim ,  Won-Jae Jang ,  Timothy Dugan Davis

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.

公开(公告)号：US10901330B2

公开(公告)日：2021-01-26

申请号：US16417706

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US20190271921A1

公开(公告)日：2019-09-05

申请号：US16417706

申请日：2019-05-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

公开(公告)号：US10338484B2

公开(公告)日：2019-07-02

申请号：US15181126

申请日：2016-06-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Arie Jeffrey Den Boef ,  Timothy Dugan Davis ,  Peter David Engblom ,  Kaustuve Bhattacharyya

IPC: G01B11/14 ,  G03F9/00 ,  G03F7/20 ,  G01B11/27

Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.