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1.发明申请OPTICAL METROLOGY OF LITHOGRAPHIC PROCESSES USING ASYMMETRIC SUB-RESOLUTION FEATURES TO ENHANCE MEASUREMENT 审中-公开用不对称子分辨率特征增强测量的光刻工艺光学计量
公开(公告)号：WO2017102299A1
公开(公告)日：2017-06-22
申请号：PCT/EP2016/079063
申请日：2016-11-29
Applicant: ASML NETHERLANDS B.V.
Inventor： SOCHA, Robert, John , WALLOW, Thomas, I.
IPC: G03F7/20
CPC classification number: G06F17/5009 , G01N21/4785 , G01N2201/127 , G03F7/2002 , G03F7/2004 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G06F17/18 , G06F2217/16 , G06N7/005 , G06N99/005
Abstract: Provided is a process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating, using one or more processors, a model with the training data by determining a first ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.
Abstract translation: 提供了校准模型的过程，所述过程包括：获得训练数据，所述训练数据包括：来自多个结构的散射辐射信息，散射辐射信息的各个部分与作为特征的各个过程条件相关联 各个结构的图案化过程; 以及使用一个或多个处理器通过确定将一个处理特性中的变化与散射辐射信息中的对应变化相关联的第一比率来校准具有训练数据的模型。
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2.发明公开
公开(公告)号：EP3391150A1
公开(公告)日：2018-10-24
申请号：EP16804751.2
申请日：2016-11-29
Applicant: ASML Netherlands B.V.
Inventor： SOCHA, Robert, John , WALLOW, Thomas, I.
IPC: G03F7/20
CPC classification number: G06F17/5009 , G01N21/4785 , G01N2201/127 , G03F7/2002 , G03F7/2004 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G06F17/18 , G06F2217/16 , G06N7/005 , G06N99/005
Abstract: A process of calibrating a model, the process including: obtaining training data including: scattered radiation information from a plurality of structures, individual portions of the scattered radiation information being associated with respective process conditions being characteristics of a patterning process of the individual structures; and calibrating a model with the training data by determining a ratio relating a change in one of the process characteristics to a corresponding change in scattered radiation information.
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