公开(公告)号：US11860549B2

公开(公告)日：2024-01-02

申请号：US17251419

申请日：2019-05-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Wolter Siemons ,  Daan Maurits Slotboom ,  Erik Peter De Kort

IPC: G03F7/00

CPC classification number: G03F7/70633 ,  G03F7/70725

Abstract: A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region including a plurality of sub-regions. The method includes obtaining measurement data relating to a process parameter of the manufacturing process for the region; and determining a correction for the manufacturing apparatus based on the measurement data. The correction is configured to maintain the process parameter within a specified range across a boundary between two of the sub-regions and/or to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the region.