公开(公告)号：WO2022037875A1

公开(公告)日：2022-02-24

申请号：PCT/EP2021/070206

申请日：2021-07-20

Applicant: ASML NETHERLANDS B.V.

Inventor： HUANG, Jiao ,  WANG, Jinze ,  SHI, Hongfei ,  FENG, Mu ,  ZHAO, Qian ,  WANG, Alvin, Jianjiang ,  XIAO, Yan-Jun ,  LIU, Liang

IPC: G03F7/20 ,  G06T7/00

Abstract: Described herein is a method for selecting good quality images from raw images of a patterned substrate. The method includes obtaining a plurality of raw images (e.g., SEM images) of a patterned substrate; determining a raw image quality metric (e.g., an image score, an average slope, distance between contours) based on data associated with gauges or contours of one or more features within each image of the plurality of raw images, the raw image quality metric being indicative of a raw image quality; and selecting, based on the raw image quality metric, a sub-set of raw images from the plurality of raw images. The sub-set of raw images can be provided for performing more accurate measurements of the one or more features within an image.