公开(公告)号：JP2012009859A

公开(公告)日：2012-01-12

申请号：JP2011136364

申请日：2011-06-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DOEDE FRANCE KUIPER ,  HANS BUTLER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70716 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide an improved lithography device, especially, a lithography device whose overlay and imaging performance are improved.SOLUTION: The lithography device includes an illumination system for adjusting a radiant beam, a support configured to support a patterning device capable of forming a pattern-imparted radiant beam by imparting a pattern to a section of the radiant beam, a substrate table configured to hold a substrate, a stage system for positioning the substrate table relative to a reference structure, a projection system for projecting the pattern-imparted radiant beam on a target part of the substrate, and an optical measurement system having a sensor part and an optical part. The optical part optically interacts with the pattern-imparted radiant beam, and transmits a result of the interaction as an output to the sensor part. The optical part is provided to the substrate table, and the sensor part is provided to the stage system or reference structure.

Abstract translation: 要解决的问题：提供一种改进的光刻装置，特别是提高其覆盖和成像性能的光刻装置。 解决方案：光刻设备包括用于调节辐射束的照明系统，被配置为支撑能够通过向辐射束的部分赋予图案而形成图案赋予的辐射束的图案形成装置的支撑件，衬底台 被配置为保持基板，用于相对于参考结构定位所述基板台的台系统，用于将所述图案赋予的辐射束投影在所述基板的目标部分上的投影系统，以及具有传感器部分和 光学部件。 光学部件与图案赋予的辐射束光学相互作用，并将相互作用的结果作为输出传递到传感器部分。 将光学部件设置在基板台上，将传感器部件设置在平台系统或基准结构上。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2015092584A

公开(公告)日：2015-05-14

申请号：JP2014243879

申请日：2014-12-02

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

Abstract: 【課題】2つのステージが互いに近づくことができるマルチステージシステムを提供する。【解決手段】第1方向と平行に延びるステータ1と、ステータ1に対して移動可能な第1ステージ3および第2ステージ7と、を備える。それらのステージは、磁場を生成するマグネットシステムを備える。ステータ1は複数の電気コイル5を備え、複数の電気コイル5は磁場と相互作用し、ステージをステータ1に対して位置決めする。それらのステージの位置を決定することと、第1ステージ3、第2ステージ7それぞれの磁場と無視できない相互作用を有する可能性のあるコイルの第1および第2サブセットを選択することと、両方のサブセットの電気コイル5を駆動することと、を含む。コイルを駆動することは、両方のサブセットの一部となっているコイルを決定することと、両方のサブセットの一部であるコイルを駆動対象から除くことと、を含む。【選択図】図9

公开(公告)号：NL2024599A

公开(公告)日：2020-08-19

申请号：NL2024599

申请日：2020-01-03

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  BAS JANSEN ,  CORNELIUS ADRIANUS LAMBERTUS DE HOON

IPC: G03F7/20

Abstract: The invention relates to an electronic system for an accelerometer having a piezoelectric element and a first mechanical resonance frequency, comprising: 5 a) a damping circuit configured to: - receive an acceleration signal from the piezoelectric element; - electronically dampen an amplitude of the first mechanical resonance frequency; and - generate a damped acceleration signal, b) an extender configured to: 10 - receive the damped acceleration signal; - extend the frequency response; and - output an extended damped acceleration signal, wherein the extender is configured to have a first electronic anti-resonance frequency matching the damped first mechanical resonance frequency, and to have a frequency response between the first 15 electronic anti-resonance frequency and a higher second frequency that is substantially opposite to a corresponding frequency response of the combination of the accelerometer and the damping circuit.

公开(公告)号：NL2025093A

公开(公告)日：2020-05-06

申请号：NL2025093

申请日：2020-03-10

Applicant: ASML NETHERLANDS BV

Inventor： BAS JANSEN ,  SAMER ABDELMOETI ABUZEID ABDELMOETI ,  HANS BUTLER ,  KOEN JOHAN FREDERIK LOONEN ,  ADITYA SINGH ,  RUBEN ETIENNE JOHAN RINUS VANDERVELDEN

IPC: G03F7/20

Abstract: The invention relates to an object positioning system including: - an actuator system; and - a measurement system, 5 wherein the actuator system comprises an actuator made of a material with predominantly electrostrictive properties and substantially no net polarization in absence of an electric field, wherein the actuator system is configured to apply an electric field to the actuator, which electric field comprises a bias electric field and an actuation electric field superimposed on the bias electric field, a field strength of said actuation electric field being equal to or smaller than a field strength of the bias 10 electric field, wherein the measurement system is configured to measure an electrical property of the actuator which is representative for a mechanical state of the actuator. [Fig 1]

公开(公告)号：NL2022090A

公开(公告)日：2019-07-10

申请号：NL2022090

申请日：2018-11-29

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER

IPC: G03F7/20

Abstract: A lithographic apparatus comprises a projection system comprising position sensors to measure a position of optical elements of the projection system. The positions sensors are referenced to a sensor frame. Damping actuators damp vibrations of the sensor frame. A control device drives the actuators and is configured to derive sensor frame damping force signals from at least one of the acceleration signals and the sensor frame position signals, derive an estimated line of sight error from the position signals , determine actuator drive signals from the sensor frame damping force signals and the estimated line of sight error, drive the actuators using the actuator drive signals to dampen the sensor frame and to at least partly compensate the estimated line of sight error.

公开(公告)号：NL2019719A

公开(公告)日：2018-05-23

申请号：NL2019719

申请日：2017-10-12

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  JOHANNES PETRUS MARTINUS VERMEULEN ,  MARINUS PETRUS REIJNDERS

IPC: G03F7/20

Abstract: A lithographic apparatus (LA) applies a pattern to a substrate (W). The lithographic apparatus includes a height sensor (LS), a substrate positioning subsystem, and a controller configured for causing the height sensor to measure the height (h) of the substrate surface at locations across the substrate. The measured heights are used to control the focusing of one or more patterns applied to the substrate. The height h is measured relative to a reference height (zref). The height sensor is operable to vary the reference height (zref), which allows a wider effective range of operation. Specifications for control of the substrate height during measurement can be relaxed. The reference height can be varied by moving one or more optical elements (566, 572, 576, 504 and/or 512) within the height sensor, or moving the height sensor. An embodiment without moving parts includes a multi-element photodetector (1212).

公开(公告)号：NL2018755A

公开(公告)日：2017-11-30

申请号：NL2018755

申请日：2017-04-20

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  ENGELBERTUS ANTONIUS FRANSISCUS VAN DER PASCH ,  PAUL CORNÉ HENRI DE WIT

IPC: G03F7/20

Abstract: There is provided a lithographic apparatus comprising a substrate table, a projection system, an encoder system, a measurement frame and a measurement system. The substrate table has a holding surface for 5 holding a substrate. The projection system is for projecting an image on the substrate. The encoder system is for providing a signal representative of a position of the substrate table. The measurement system is for measuring a property of the lithographic apparatus. The holding surface is along a plane. The projection system is at a first side of the plane. The measurement frame is arranged to support at least part of the encoder system and at least part of the measurement system at a second side of the plane different from the first side.

公开(公告)号：NL2018296A

公开(公告)日：2017-09-07

申请号：NL2018296

申请日：2017-02-03

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  CORNELIUS ADRIANUS LAMBERTUS DE HOON ,  JEROEN PIETER STARREVELD ,  MAURICE WILLEM JOZEF ETIËNNE WIJCKMANS ,  FRANSISCUS MATHIJS JACOBS ,  PAVEL KAGAN

IPC: G03F7/20

Abstract: The invention relates to a vibration isolator, comprising: a base; a coupling element to be coupled to a vibration sensitive object; a decoupling mass; a first vibration isolator part arranged between the base and the decoupling mass; and a second vibration isolator part arranged between the decoupling mass and the coupling element, and wherein at least one of the first and second vibration isolator part comprises a pneumatic isolator.

公开(公告)号：NL2017808A

公开(公告)日：2017-06-02

申请号：NL2017808

申请日：2016-11-17

Applicant: ASML NETHERLANDS BV

Inventor： HANS BUTLER ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  ENGELBERTUS ANTONIUS FRANSISCUS VAN DER PASCH

IPC: G03F7/20

Abstract: A positioning device configured to position an object is described, the positioning device comprising: an object table configured to hold the object; a positioning module configured to position the object table, the positioning module comprising: o a first positioning module member configured to hold the object table; o a second positioning module member configured to support the first positioning module member and to co-operate with the first positioning module member to generate a first force; a support frame configured to support the second positioning module member; the second positioning module member being configured to displace relative to the support frame in response to a horizontal reaction force; one or more actuators configured to displace the second positioning module member in a vertical direction relative to the support frame; a position measurement system configured to measure a position of the object table with respect to a reference frame; and a control unit configured to control a position of the object table by providing an object table control signal to the positioning module to generate the first force, based on the measured position of the object table and a set point for the object table; wherein the control unit is further configured to control a vertical position of the second position module member by provide an actuator control signal to the one or more actuators, so as to maintain a top surface of the second positioning module member substantially parallel to a bottom surface of the first positioning module member.

公开(公告)号：NL2017554A

公开(公告)日：2017-06-02

申请号：NL2017554

申请日：2016-09-30

Applicant: ASML NETHERLANDS BV

Inventor： JUNICHI KANEHARA ,  HANS BUTLER ,  PAUL CORNÉ HENRI DE WIT ,  ENGELBERTUS ANTONIUS FRANSISCUS VAN DER PASCH

IPC: G03F7/20

Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.