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    Lithographic device and device manufacturing method
    1.
    发明专利
    Lithographic device and device manufacturing method 有权
    LITHOGRAPHIC DEVICE AND DEVICE MANUFACTURING METHOD

    公开(公告)号：JP2013042157A

    公开(公告)日：2013-02-28

    申请号：JP2012220645

    申请日：2012-10-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES MARIA ,  WAKKER REMKO

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70783 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a substrate clamp system and a lithographic device capable of avoiding stress guided by particles and/or heat in a substrate and improving pattern transfer accuracy.SOLUTION: A lithographic device configured so as to transfer a pattern from a patterning device to a substrate W includes: a substrate table configured so as to hold the substrate; a first clamp system 40, 128 configured so as to clamp the substrate table to a substrate table support structure; and a second clamp system 40, 129 configured so as to clamp the substrate to the substrate table after the substrate table is clamped to the substrate table support structure.

    Abstract translation: 要解决的问题：提供一种能够避免由基板中的颗粒和/或热引起的应力的基板夹紧系统和光刻装置，并提高图案转印精度。 解决方案：构造成将图案从图案形成装置传送到基板W的光刻装置包括：被配置为保持基板的基板台; 被配置为将衬底台夹持到衬底台支撑结构的第一夹紧系统40,128; 以及第二夹紧系统40,129，其被配置为在将基板台夹紧到基板台支撑结构之后将基板夹紧到基板台。 版权所有（C）2013，JPO＆INPIT

    Lithographic apparatus, and device manufacturing method
    2.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2010141313A

    公开(公告)日：2010-06-24

    申请号：JP2009270951

    申请日：2009-11-30

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： HOUBEN MARTIJN

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To reduce the risk of forming bubbles in an immersion liquid through which a beam passes. SOLUTION: In an immersion lithographic apparatus, bubble formation in the immersion liquid is reduced or prevented by reducing a gap size or area on a substrate table. The gap size is reduced using an edge member which may be, for example, a ring known as a BES (Bubble Extraction System) ring. Information regarding the shape and/or cross-sectional dimension (e.g., diameter) of the substrate, or information regarding the gap size, is transmitted to a controller that controls the edge member in order for the edge member, for example, to be reduced to an appropriate size to reduce the gap as much as possible, desirably without compressing the edge of the substrate. Alternatively or additionally, the gap may be reduced by moving the substrate and/or the edge member adjacent the edge of a surface of the substrate table. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少在光束通过的浸没液中形成气泡的风险。 解决方案：在浸没式光刻设备中，通过减小衬底台上的间隙尺寸或面积来降低或防止浸没液中的气泡形成。 使用可以是例如称为BES（气泡提取系统）环的环的边缘构件来减小间隙尺寸。 关于基板的形状和/或横截面尺寸（例如，直径）或关于间隙尺寸的信息的信息被传送到控制边缘构件的控制器，以便例如边缘构件被减小 达到适当的尺寸以尽可能地减小间隙，期望地不压缩基底的边缘。 或者或另外，通过使衬底和/或边缘构件邻近衬底台的表面的边缘移动可以减小间隙。 版权所有（C）2010，JPO＆INPIT

    Calibration method and lithographic apparatus for calibrating optimum take over height of substrate
    3.
    发明专利
    Calibration method and lithographic apparatus for calibrating optimum take over height of substrate 有权
    用于校准基板高度最佳采样的校准方法和平面设备

    公开(公告)号：JP2010109369A

    公开(公告)日：2010-05-13

    申请号：JP2009244037

    申请日：2009-10-23

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： COMPEN RENE THEODORUS PETRUS ,  VAN NUNEN GERARDUS PETRUS MATTHIJS ,  HOUBEN MARTIJN ,  VAN DEN HEUVEL MARCO ADRIANUS PETER

    IPC: H01L21/027 ,  G12B5/00 ,  H01L21/68

    CPC classification number: G03B27/58 ,  G03F7/70516 ,  G03F7/70691

    Abstract: PROBLEM TO BE SOLVED: To provide a method for calibrating an optimum take over height of a substrate in a lithographic apparatus between a substrate table and an ejector element movable to load and unload the substrate from the substrate table. SOLUTION: The method includes clamping the substrate on one of the substrate table and ejector element; moving the ejector element between an unloaded state wherein the substrate is supported by the substrate table and a loaded state wherein the substrate is at least partly supported by the ejector element; determining a reference height of the ejector element at the moment that the weight of the substrate is at least partly taken over between the substrate table and the ejector element; and determining the optimum take over height for the ejector element from the determined reference height. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于校准光刻设备中的基板的最佳接管高度的方法，该基板在可移动以从基板台加载和卸载基板的基板台和顶出元件之间。 解决方案：该方法包括将衬底夹在衬底台和顶出器元件中的一个上; 在所述衬底被所述衬底台支撑的卸载状态和所述衬底至少部分地被所述顶出器元件支撑的负载状态之间移动所述顶出器元件; 在衬底的重量至少部分地覆盖在衬底台和顶出器元件之间的时刻，确定顶出器元件的基准高度; 以及从所确定的参考高度确定所述喷射器元件的最佳接管高度。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and device manufacturing method
    6.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2007311787A

    公开(公告)日：2007-11-29

    申请号：JP2007123107

    申请日：2007-05-08

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： RENE THEODORUS PETRUS COMPEN ,  VOZNYI OLEG ,  HOUBEN MARTIJN ,  BOUCHAIBI MAJID EL ,  BOEKHOLT FRANCISCUS JOHANNES M ,  WAKKER REMKO

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70783 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can avoid stress guided by particles and heat in a substrate and can improve precision of pattern transcription. SOLUTION: This lithographic apparatus comprises a support structure MT connected with a primary positioner PM, which is configured to support a lighting system (illuminator) IL configured to adjust radiation beam B and a patterning device MA, and also to correctly position the patterning device according to a specific parameter; a substrate table WT that can connect with a secondary positioner PW, which is configured to correctly position the substrate W according to a specific parameter; and a projection system PS that is configured to project a pattern given to the radiation beam B by the patterning device MA to the target portion C of the substrate W. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种可以避免由基质引起的颗粒和热引起的应力的光刻设备，并且可以提高图案转录的精度。 解决方案：该光刻设备包括与初级定位器PM连接的支撑结构MT，其构造成支撑被配置为调节辐射束B的照明系统（照明器）IL和图案形成装置MA，并且还正确地定位 图案形成装置根据具体参数; 能够与辅助定位器PW连接的基板台WT，其被构造成根据特定参数正确定位基板W. 以及投影系统PS，其被配置为将由图案形成装置MA向辐射束B施加的图案投影到基板W的目标部分C.版权所有（C）2008，JPO＆INPIT

    LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICE
    8.
    发明专利
    LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING DEVICE 审中-公开

    公开(公告)号：JP2012109618A

    公开(公告)日：2012-06-07

    申请号：JP2012045021

    申请日：2012-03-01

    Applicant: ASML NETHERLANDS BV

    Inventor： HOUBEN MARTIJN

    IPC: H01L21/027 ,  G02B21/00

    Abstract: PROBLEM TO BE SOLVED: To reduce the risk that bubbles are formed in an immersion liquid through which a beam passes.SOLUTION: In an immersion lithography apparatus, formation of bubbles in an immersion liquid is reduced or prevented by reducing the size or the region of a gap above a substrate table. The gap size is reduced using an edge member which may be a ring, well known as a BES (bubble extraction system) ring, for example. In order to reduce the gap as much as possible by reducing the edge member to have a proper size without compressing the edge of a substrate desirably, information about the shape and/or the section size (e.g. diameter) of the substrate, or information about the gap size is transmitted to a controller controlling the edge member. Alternatively or additionally, the gap can be reduced by moving the edge member contiguous to the edge of the substrate and/or the surface of the substrate table.

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