公开(公告)号：JP2007017977A

公开(公告)日：2007-01-25

申请号：JP2006185665

申请日：2006-07-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN DER SCHOOT HARMEN KLAAS ,  JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VOSTERS PETRUS MATTHIJS HENRIC ,  HAZENBERG JOHANNES MARTINUS AN ,  VAN BEUZEKOM AART A

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/683

CPC classification number: G03F7/70875 ,  G03F7/7075

Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method. SOLUTION: The substrate handler for handling a substrate comprises a conditioning device for conditioning the substrate. The substrate handler is provided with a displacing device configured so as to displace the substrate in the direction substantially parallel to a support surface. The displacing device is configured so as to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. The substrate handler comprises a float device configured to provide an air bed above a support surface of the substrate handler. The substrate handler is configured so as to hold the substrate on an air bed during the conditioning of the substrate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供基板处理器，光刻设备和器件制造方法。 解决方案：用于处理衬底的衬底处理器包括用于调节衬底的调节装置。 衬底处理器设置有置换装置，其被配置为在基本上平行于支撑表面的方向上移位衬底。 置换装置构造成在调节过程中将衬底从一个调节位置移动到一个或多个其它调理位置。 衬底处理器包括浮动装置，其构造成在衬底处理器的支撑表面上方提供空气床。 衬底处理器被配置为在衬底调节期间将衬底保持在空气床上。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006121081A

公开(公告)日：2006-05-11

申请号：JP2005302463

申请日：2005-10-18

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： COX HENRIKUS HERMAN MARIE ,  HOL SVEN ANTOIN JOHAN ,  JACOBS HERNES

IPC: H01L21/027 ,  H01L21/68 ,  H02K41/02

CPC classification number: G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide an actuator assembly easy to assemble, dissassemble, attach and remove. SOLUTION: This actuator assembly includes a coil that can work and can be positioned in a magnetic field generated by a magnet assembly. Virtually only one side surface of each of the coil and the magnet faces the other. In order to generate a force having a primary degree of freedom, magnetized elements are arranged for the purpose of forming the magnetic field so that the magnetic field is nearly perpendicular with respect to the direction of current. As a result, the coil can be attached easily, since there is no need to surround the coil with magnetic poles. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供易于组装，拆卸，附接和拆卸的致动器组件。 解决方案：该致动器组件包括可以工作并可以定位在由磁体组件产生的磁场中的线圈。 实际上，每个线圈和磁体的几乎只有一个侧面面对另一个。 为了产生具有初级自由度的力，为了形成磁场的目的而设置磁化元件，使得磁场相对于电流方向几乎垂直。 结果，可以容易地安装线圈，因为不需要用磁极围绕线圈。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004040106A

公开(公告)日：2004-02-05

申请号：JP2003197463

申请日：2003-06-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VOSTERS PETRUS MATTHIJS HENRIC ,  JACOBS HERNES ,  VAN HEUMEN MARK

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70733 ,  G03F7/70716 ,  G03F7/70725

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the sensitivity of an influence of a collision on a horizontal plane is reduced.
SOLUTION: A lithography projecting apparatus includes a vacuum chamber having a first exhaust means for generating a vacuum beam path for a projecting beam. The projecting apparatus includes a collision protecting device for reducing the influence of the collision of an article table with the wall of the chamber or other article table. These collisions have probabilities of bringing about a software error in a software of the apparatus during a power source failure.
COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003086504A

公开(公告)日：2003-03-20

申请号：JP2002235856

申请日：2002-08-13

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS RUDOLF ,  JACOBS HERNES ,  BUIS EDWIN JOHAN

IPC: H01L21/027 ,  F16J3/04 ,  F16L11/15 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a bellows for a lithography device which can separate torsional vibrations, force or moments. SOLUTION: The bellows for use in connecting two airtight regions of the lithography device or connecting a region and a pump has a first region having a smooth spiral undulation and a second region capable of absorbing movement in the vertical direction caused by the relative rotation of ends of the first region. The second region can be used as an mirror image of the first region, one of circumferential undulations or as a plurality of subregions.

公开(公告)号：JP2011029657A

公开(公告)日：2011-02-10

申请号：JP2010220937

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate.
SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high.
COPYRIGHT: (C)2011,JPO&INPIT

公开(公告)号：JP2011029656A

公开(公告)日：2011-02-10

申请号：JP2010220936

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  GILISSEN NOUD JAN ,  JANSEN HANS ,  KATE NICOLAAS TEN ,  KEMPER NICOLAAS R ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LOOPSTRA ERIK R ,  HUBERTUS MULKENS JOHANNES C ,  HARMEN KLAAS VAN DER SCHOOT ,  STAVENGA MARCO KOERT ,  STREEFKERK BOB ,  VERHAGEN MARTINUS CORNELIS MARIA ,  STEIJAART PETER PAUL ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  VAN DER HOEVEN JAN CORNELIS

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To moderate a defect induced by an immersion liquid in an immersion lithography projection apparatus where a liquid removal system surrounds a liquid supply system for providing liquid to a space between a projection system and a substrate. SOLUTION: The liquid removal system 100 is moveable relative to the liquid supply system (partially shown as a barrier member 12) and controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system (partially shown as the barrier member 12) and the liquid removal system 100 may be covered and an atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained so that the vapor pressure of liquid is relatively high. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：为了缓和浸没光刻投影装置中的浸没液体引起的缺陷，其中液体移除系统围绕用于向投影系统和基板之间的空间提供液体的液体供应系统。 解决方案：液体移除系统100可相对于液体供应系统（部分地示为阻挡构件12）移动并被控制为相对于移动的衬底台具有基本上零的速度。 可以覆盖液体供应系统（部分示为阻挡构件12）和液体移除系统100之间的间隙，并且可以保持液体供应系统和衬底台上方的液体移除系统之间的气氛，使得蒸气压 的液体比较高。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2009231846A

公开(公告)日：2009-10-08

申请号：JP2009146010

申请日：2009-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677

Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler capable of functioning more efficiently. SOLUTION: The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus. COPYRIGHT: (C)2010,JPO&INPIT

公开(公告)号：JP2009231845A

公开(公告)日：2009-10-08

申请号：JP2009146006

申请日：2009-06-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JACOBS HERNES ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS MATTHIJS HENRIC

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677

Abstract: PROBLEM TO BE SOLVED: To provide a substrate handler capable of functioning more efficiently. SOLUTION: The substrate handler 12 is adapted to load a substrate 8 onto a substrate table 6 before exposure and to unload the substrate 8 from the substrate table 6 after exposure. The substrate handler 12 includes at least one support surface adapted to simultaneously convey a plurality of independent substrates 8, 8, or platforms 14, 16. The substrate handler 12 moves the substrate 8 with respect to the substrate table 6 of a lithographic apparatus. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供能够更有效地起作用的基板处理器。 解决方案：衬底处理器12适于在曝光之前将衬底8加载到衬底台6上，并且在曝光之后从衬底台6卸载衬底8。 衬底处理器12包括适于同时传送多个独立衬底8,8或平台14,16的至少一个支撑表面。衬底处理器12相对于光刻设备的衬底台6移动衬底8。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2005347756A

公开(公告)日：2005-12-15

申请号：JP2005163682

申请日：2005-06-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TERKEN MARTINUS ARNOLDUS HENRI ,  JACOBS HERNES ,  VAN DER SCHOOT HARMEN KLAAS ,  VOSTERS PETRUS M H ,  ZAAL KOEN JACOBUS JOHANNES MAR

IPC: H01L21/027 ,  G03F7/20 ,  H01J37/20

CPC classification number: G03F7/70716

Abstract: PROBLEM TO BE SOLVED: To provide a lithography, including a light weight carriage for a lithographic device with a large rigidity and having full cooling characteristics and arranging characteristics. SOLUTION: There is provided a lithographic device, having a lighting system for adjusting a radiation beam, an article support member for supporting an article placed in the beam path of the radiation beam, and a lithography device having a movable carriage for moving the article support member. The carriage includes a compartmented compound structure, having a non-compound mounting interface and/or cooling interface. With this structure, for example, interface using metal or ceramic materials can be used in combination with an advantage of the compound structure, such as low specific gravity and high Young's modulus at a position and in a direction requiring high strength and high stability and high electrical resistance. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种平版印刷术，其包括具有大刚性并且具有完全冷却特性和布置特性的用于光刻设备的重量轻的滑架。 解决方案：提供了一种光刻设备，其具有用于调节辐射束的照明系统，用于支撑放置在辐射束的光束路径中的物品的物品支撑构件，以及具有用于移动的可移动托架的光刻装置 文章支持成员。 托架包括具有非复合安装界面和/或冷却界面的分隔的复合结构。 通过这种结构，例如可以使用金属或陶瓷材料的界面与复合结构的优点结合使用，例如在要求高强度，高稳定性和高稳定性的位置和方向上的低比重和高杨氏模量 电阻。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2011071545A

公开(公告)日：2011-04-07

申请号：JP2010275375

申请日：2010-12-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JANSEN HANS ,  CORNELISSEN SEBASTIAAN MARIA J ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JACOBS HERNES ,  ANTONIUS LEENDERS MARTINUS H ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD CORNELIS ,  SMITS PETER ,  JANSSEN FRANCISCUS JOHANNES J ,  RIEPEN MICHEL

IPC: H01L21/027

CPC classification number: G03F7/70341 ,  G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus that prevents an adverse effect on pattern image quality due to existence of bubbles in immersion liquid.
SOLUTION: The liquid immersion lithographic exposure apparatus minimizes or prevents generation of bubbles in the immersion liquid by reducing a size or a volume of a gap between an object and the top of a substrate table and/or preparing a cover plate covering the gap. Additionally, an actuator for laterally moving the object in a hole in order to reduce the gap between an edge of the object and a side of the hole of the support table when the object and the table are in contact with the liquid, may be prepared.
COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种液浸光刻设备，其防止由于浸没液体中的气泡的存在而对图案图像质量的不利影响。 解决方案：液浸式光刻曝光装置通过减小物体与基板台顶部之间的间隙的尺寸或体积，和/或制备覆盖该基板台的盖板来最小化或防止在浸液中产生气泡 间隙。 此外，可以准备用于在物体和台面与液体接触的同时横向移动物体在孔中的致动器，以便减小物体的边缘与支撑台的孔的一侧之间的间隙 。 版权所有（C）2011，JPO＆INPIT