公开(公告)号：JP2008072100A

公开(公告)日：2008-03-27

申请号：JP2007212516

申请日：2007-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To improve the position measuring accuracy of a lithography device. SOLUTION: A stage system for the lithography equipment is provided. The stage system includes a movable stage and a still motor coil assembly including a coil, and the coil forms a moving magnetic motor for interacting with the magnet of the movable stage and driving the movable stage. The stage system further includes a position measuring system for measuring the position within an operation area of the movable stage, and the position measuring system moves a measuring beam along a measuring beam path extending toward the movable stage at the upper part of a part of the motor coil assembly. The coil assembly includes a coil assembly path between motor coils for driving a motor, and the coil assembly path extends at the lower part of the measuring beam path. The movable stage can include a substrate stage or a reticle stage. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提高光刻设备的位置测量精度。

解决方案：提供了一种用于光刻设备的平台系统。 舞台系统包括可移动台和包括线圈的静止马达线圈组件，线圈形成用于与可移动台的磁体相互作用并驱动可移动台的移动磁马达。 舞台系统还包括位置测量系统，用于测量可移动舞台的操作区域内的位置，并且位置测量系统沿测量光束移动测量光束，该测量光束沿着可移动舞台的一部分的上部延伸 电机线圈组件。 线圈组件包括用于驱动马达的马达线圈之间的线圈组合路径，并且线圈组件路径在测量光束路径的下部延伸。 可移动台可以包括衬底台或掩模版台。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008060563A

公开(公告)日：2008-03-13

申请号：JP2007212517

申请日：2007-08-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: H02P5/46 ,  G03F7/70725 ,  G03F7/70758 ,  H02P25/08

Abstract: PROBLEM TO BE SOLVED: To provide a method for controlling a short stroke module in a lithography equipment substrate stage or a reticle stage. SOLUTION: A movable object is operated at a first degree of freedom. Step (a) makes a first motor assembly including at least one motor of first type or a plurality of motors and a second motor assembly including at least one motor of second type or a plurality of motors and enables each of the first and second motor assemblies to move the movable object at the first degree of freedom; step (b) supplies a feed forward signal from a feed forward unit to the first motor assembly based on the feed forward reference signal; and step (c) supplies a position control signal from a position control unit to the second motor assembly based on the position control reference signal. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于控制光刻设备基板台或标线片台中的短行程模块的方法。 解决方案：可移动物体以第一自由度运行。 步骤（a）制造包括至少一个第一类型的电动机或多个电动机的第一电动机组件和包括至少一个第二类型的电动机或多个电动机的第二电动机组件，并且使第一和第二电动机组件 以第一自由度移动可移动物体; 步骤（b）基于前馈参考信号将来自前馈单元的前馈信号提供给第一电动机组件; 并且步骤（c）基于位置控制参考信号将位置控制信号从位置控制单元提供给第二电动机组件。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008034844A

公开(公告)日：2008-02-14

申请号：JP2007187146

申请日：2007-07-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F9/00 ,  H01L21/68

CPC classification number: G03F7/70716 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide a stage unit that is simplified, is further versatile, and has a high accuracy. SOLUTION: The lithographic unit includes an illuminating system that controls a radiation beam, a patterning support that retains a patterning device for patternizing the radiation beam, a substrate support that retains a substrate, a projection system that projects the radiation beam with a pattern, an additional support, and a flexible line assembly that transmits at least any one of current, signal, and fluid. A first portion of the line assembly is extended between a base and the additional support, and a second portion is extended between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction and is coupled with any one of the patterning support and the substrate support. A second motor assembly generates a force in at least one direction and is coupled with the additional support. The first motor assembly includes the planar motor. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：为了提供简化的，更通用的并且具有高精度的平台单元。 解决方案：光刻单元包括控制辐射束的照明系统，保持用于使辐射束图案化的图案形成装置的图案形成支撑件，保持衬底的衬底支撑件，将辐射束投射到投影系统的投影系统 图案，附加支撑件以及透射电流，信号和流体中的至少任何一个的柔性线组件。 线组件的第一部分在基部和附加支撑件之间延伸，并且第二部分在附加支撑件和图案形成支撑件或基板支撑件之间延伸。 第一电动机组件在至少一个方向上产生力并且与图案形成支撑件和衬底支撑件中的任何一个结合。 第二电动机组件在至少一个方向上产生力并且与附加支撑件相耦合。 第一马达组件包括平面马达。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2008091892A

公开(公告)日：2008-04-17

申请号：JP2007228805

申请日：2007-09-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03B27/58 ,  G03F7/70733 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide a positioning device that virtually determines the position of first and second movable objects in a common operating zone. SOLUTION: A positioning device comprises a first coil assembly arranged next to the operating zone, a second coil assembly arranged on the opposite side of the operating zone, one or more first magnets arranged on the first movable object that work together with the first coil assembly, and one or more second magnets arranged on the second movable object that work together with the second coil assembly. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种在公共操作区域中虚拟地确定第一和第二可移动物体的位置的定位装置。 解决方案：定位装置包括布置在操作区旁边的第一线圈组件，布置在操作区的相对侧上的第二线圈组件，布置在第一可移动对象上的一个或多个第一磁体，其与 第一线圈组件和布置在第二可移动物体上的一个或多个第二磁体，其与第二线圈组件一起工作。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：SG139665A1

公开(公告)日：2008-02-29

申请号：SG2007052038

申请日：2007-07-12

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  KLAASSEN FRANCISCUS ADRIANUS G

Abstract: LITHOGRAPHIC APPARATUS WITH PLANAR MOTOR DRIVEN SUPPORT A lithographic apparatus includes an illumination system that conditions a radiation beam, a patterning support holding a patterning device that patterns the radiation beam, a substrate support to hold a substrate, a projection system to project the patterned radiation beam onto the substrate, an additional support, and a flexible line assembly to transfer at least one of a current, a signal and a fluid. A first part of the line assembly extends between a base and the additional support, and a second part extends between the additional support and the patterning support or the substrate support. A first motor assembly generates a force in at least one direction, and is coupled to the one of the patterning support and the substrate support. A second motor assembly generates a force in the at least one direction, and is coupled to the additional support. The first motor assembly includes a planar motor.

公开(公告)号：DE60026461T2

公开(公告)日：2006-09-28

申请号：DE60026461

申请日：2000-10-10

Applicant: ASML NETHERLANDS BV

Inventor： VAN DE PASCH ENGELBERTUS ANTON ,  VAN MEER ASCHWIN LODEWIJK HEND ,  KLAASSEN FRANCISCUS ADRIANUS G

IPC: G03F7/20 ,  G01N21/94 ,  H01L21/027

Abstract: A lithographic projection apparatus is disclosed. The lithographic projection apparatus includes an illumination system to supply a projection beam of radiation, a first object table to hold a mask, a second object table provided with a support surface to support and hold a substrate at its backside surface and a projection system to image an irradiated portion of the mask onto a target portion of the substrate including a detector constructed and arranged to detect the presence of contamination on one or both of the support surface and the substrate backside surface.