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    Method for alignment and lithographic apparatus
    2.
    发明专利
    Method for alignment and lithographic apparatus 有权
    对准和平铺设备的方法

    公开(公告)号：JP2012028815A

    公开(公告)日：2012-02-09

    申请号：JP2011235644

    申请日：2011-10-27

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS MARIA

    IPC: H01L21/027 ,  G01B11/00 ,  G03F9/00

    CPC classification number: G03B27/58 ,  G03F9/7092

    Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for reducing noise in an original signal which contains a linear time-varying signal and the noise.SOLUTION: In the method and apparatus, the original signal is differentiated to obtain a differentiated original signal. The differentiated original signal is Fourier transformed to obtain power spectral densities of the differentiated original signal. A noise frequency is detected in a power spectral density spectrum of the obtained power spectral densities of the differentiated original signal. For the noise frequency, a corresponding noise component is determined. The noise component is subtracted from the original signal to obtain a noise-reduced original signal.

    Abstract translation: 解决的问题：提供一种降低包含线性时变信号和噪声的原始信号中的噪声的方法和装置。 解决方案：在该方法和装置中，对原始信号进行微分以获得分化的原始信号。 差分原始信号被傅立叶变换以获得差分原始信号的功率谱密度。 在获得的差分原始信号的功率谱密度的功率谱密度谱中检测噪声频率。 对于噪声频率，确定相应的噪声分量。 从原始信号中减去噪声分量，以获得噪声降低的原始信号。 版权所有（C）2012，JPO＆INPIT

    Imprint lithographic apparatus, and imprint lithographic method
    3.
    发明专利
    Imprint lithographic apparatus, and imprint lithographic method 有权
    IMPRINT LITHOGRAPHIC APPARATUS和IMPRINT LITHOGRAPHIC方法

    公开(公告)号：JP2011135077A

    公开(公告)日：2011-07-07

    申请号：JP2010282942

    申请日：2010-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN ,  VAN DER WIJST MARC WILHELMUS MARIA ,  STARREVELD JEROEN PIETER ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS ,  DEBIESME FRANCOIS XAVIER

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/0002 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  F16F9/535 ,  F16F15/002 ,  F16F15/0275 ,  F16F15/03

    Abstract: PROBLEM TO BE SOLVED: To provide a vibration isolation system for an imprint lithographic apparatus, capable of improving a throughput of an imprint lithographic apparatus.
    SOLUTION: An imprint lithographic apparatus 100 includes an actuator 130 displacing an imprint template holder 110 relative to a substrate holder 120. A support structure 140 of the imprint template holder 110 and/or the substrate holder 120 is attached to a vibration isolation system 150 attached to a base 160. The vibration isolation system 150 isolates vibration of the support structure 140 relative to the base 160. A control unit controlling the actuator 130 in an imprint process controls an adjusting member of the vibration isolation system 150, and adjusts a dynamic characteristic of the vibration isolation system 150 during at least part of the imprint process to reduce a displacement of the support structure 140 relative to the base 160, the displacement being caused by a force acting the support structure 140.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种能够提高压印光刻设备的生产量的压印光刻设备的隔振系统。 压印光刻设备100包括致动器130，其相对于衬底保持器120移动压印模板保持器110.压印模板保持器110和/或衬底保持器120的支撑结构140附接到振动隔离 系统150附接到基座160.隔振系统150隔离支撑结构140相对于基座160的振动。在压印过程中控制致动器130的控制单元控制隔振系统150的调节构件，并调节 在压印过程的至少一部分期间防振系统150的动态特性，以减小支撑结构140相对于基座160的位移，该位移是由作用于支撑结构140的力引起的。版权所有： （C）2011，JPO＆INPIT

    Measurement system for measuring position dependence signal of movable object, and lithographic device and method
    4.
    发明专利
    Measurement system for measuring position dependence signal of movable object, and lithographic device and method 有权
    用于测量可移动对象的位置依赖性信号的测量系统，以及地平线设备和方法

    公开(公告)号：JP2011097073A

    公开(公告)日：2011-05-12

    申请号：JP2010283303

    申请日：2010-12-20

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  ZAAL KOEN JACOBUS J M

    IPC: H01L21/027 ,  G01B11/00

    CPC classification number: G03F7/7085 ,  G03F7/70425 ,  G03F7/70775 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide favorably an encoder type highly accurate measurement system configured to measure a position dependent signal of a movable object with almost no substantial influence of the motion of the moving object on measuring accuracy.
    SOLUTION: The encoder type measurement system is configured to measure the position dependent signal of the movable object and includes at least one sensor attachable onto the movable object, a sensor target attachable onto a substantially stationary frame, and an attaching device configured to attach the sensor target onto the substantially stationary frame. It further includes a compensation device configured to compensate for movement and/or deformation of a sensor target object relative to the substantially stationary frame. The compensation device may include a passive type or active type damping device and/or a feedback position control system. In a substitute embodiment, the compensation device includes a gripping device fixing the position of the sensor target object.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种编码器型高精度测量系统，其被配置为测量可移动物体的位置相关信号，几乎不会对移动物体的运动产生实质影响的测量精度。 解决方案：编码器类型测量系统被配置为测量可移动物体的位置相关信号，并且包括可附接到可移动物体上的至少一个传感器，可附接到基本上固定的框架上的传感器目标，以及被配置为 将传感器目标物附接到基本上固定的框架上。 其还包括补偿装置，其被配置为补偿传感器目标物体相对于基本上静止的框架的移动和/或变形。 补偿装置可以包括无源型或主动型阻尼装置和/或反馈位置控制系统。 在替代实施例中，补偿装置包括固定传感器目标物体的位置的夹持装置。 版权所有（C）2011，JPO＆INPIT

    Method of damping object, active damping system, and lithographic apparatus
    5.
    发明专利
    Method of damping object, active damping system, and lithographic apparatus 有权
    阻尼对象，主动阻尼系统和平面设备的方法

    公开(公告)号：JP2010153854A

    公开(公告)日：2010-07-08

    申请号：JP2009279995

    申请日：2009-12-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DER WIJST MARC WILHELMUS MARIA

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: F16F15/002 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide a method of damping an object in motion at two or greater of degrees of freedom. SOLUTION: In the method, positional quantities are measured at each of two or more of the positions of measurements, measurement signals are extracted at every dynamic mode from the measured positional quantities and controller units connected to each corresponding dynamic mode are supplied with the measurement signals in one dynamic mode. In the method, output signals are provided at every dynamic mode on the basis of each measurement signal, to which the controller units correspond, and control signals are provided to each of two or of actuators. In the method, the control signals at every actuator are based on output signals from one or two or more of the controller units. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种在两个或更多个自由度下运动的物体的阻尼方法。 解决方案：在该方法中，在测量位置的两个或多个位置中的每一个处测量位置量，在每个动态模式下从测量的位置量中提取测量信号，并且连接到每个对应的动态模式的控制器单元被提供 测量信号在一个动态模式。 在该方法中，根据控制器单元对应的每个测量信号，在每个动态模式下提供输出信号，并且向两个或每个致动器中的每一个提供控制信号。 在该方法中，每个致动器处的控制信号基于来自一个或两个或多个控制器单元的输出信号。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and projection assembly
    6.
    发明专利
    Lithographic apparatus and projection assembly 有权
    地平线装置和投影装置

    公开(公告)号：JP2012104862A

    公开(公告)日：2012-05-31

    申请号：JP2012031504

    申请日：2012-02-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN DER WIJST MARC WILHELMUS MARIA ,  LOOPSTRA ERIK ROELOF ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/709 ,  F16F7/1005

    Abstract: PROBLEM TO BE SOLVED: To increase a stable operating range of active damping.SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to damp a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency on a signal provided by the sensor. The active damping system is connected to a damping mass, which is connected to the projection system.

    Abstract translation: 要解决的问题：增加主动阻尼的稳定工作范围。 解决方案：光刻设备包括被配置为调节辐射束的照明系统和构造成支撑图案形成装置的支撑件。 光刻设备还包括被构造成保持衬底的衬底台和配置成将图案化的光束投影到衬底的目标部分上的投影系统。 提供了一种主动阻尼系统来减轻至少部分投影系统的振动。 主动阻尼系统包括传感器的组合，该传感器用于测量投影系统的位置量，以及致动器，其依赖于由传感器提供的信号在投影系统上施加力。 主动阻尼系统连接到连接到投影系统的阻尼块。 版权所有（C）2012，JPO＆INPIT

    Lithographic apparatus having feed forward pressure pulse compensation for metrology frame
    7.
    发明专利
    Lithographic apparatus having feed forward pressure pulse compensation for metrology frame 有权
    具有进给压力脉冲补偿的平面设备的平面设备

    公开(公告)号：JP2010016369A

    公开(公告)日：2010-01-21

    申请号：JP2009139706

    申请日：2009-06-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  VAN DUIJNHOVEN MARTINUS ,  VAN DER WIJST MARC WILHELMUS MARIA

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03B27/54 ,  G03B27/62 ,  G03F7/70716 ,  G03F7/709

    Abstract: PROBLEM TO BE SOLVED: To provide an efficient feed forward compensation mechanism for compensating pressure pulses caused by movements of an object of a device in relation to a metrology frame. SOLUTION: A lithographic apparatus including: a projection system; a metrology frame MF supported by a vibration isolation support device ISD; a movable object WT; and a displacement determining unit to determine positions, speeds and/or accelerations of the object WT in relation to the metrology frame MF and/or a projection system. At least one actuator F is provided for applying correcting forces and/or torques on the metrology frame MF, and a controller C is provided which is configured to calculate the correcting forces and/or torques to be applied to the metrology frame MF on the basis of the determined positions, speeds and/or accelerations of the object WT in order to compensate pressure pulses exerted on the metrology frame MF caused by movements of the object WT in relation to the metrology frame MF. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种有效的前馈补偿机构，用于补偿由相对于计量框架的装置的物体的移动引起的压力脉冲。 解决方案：一种光刻设备，包括：投影系统; 由振动隔离支撑装置ISD支撑的计量框架MF; 可移动物体WT; 以及位移确定单元，用于确定对象WT相对于度量框架MF和/或投影系统的位置，速度和/或加速度。 提供至少一个致动器F用于在计量框架MF上施加校正力和/或扭矩，并且提供控制器C，该控制器被配置为基于基础计算施加到计量框架MF的校正力和/或扭矩 的物体WT的确定位置，速度和/或加速度，以便补偿由对象WT相对于计量帧MF的移动而施加在计量框架MF上的压力脉冲。 版权所有（C）2010，JPO＆INPIT

    Lithographic apparatus and method for correcting position of stage of lithographic apparatus
    8.
    发明专利
    Lithographic apparatus and method for correcting position of stage of lithographic apparatus 有权
    用于校正光刻设备阶段位置的平面设备和方法

    公开(公告)号：JP2011176310A

    公开(公告)日：2011-09-08

    申请号：JP2011031905

    申请日：2011-02-17

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： BUTLER HANS ,  EUSSEN EMIEL JOZEF MELANIE ,  KOENEN WILLEM HERMAN GERTRUDA ANNA ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  HARMEN KLAAS VAN DER SCHOOT ,  VAN DER WIJST MARC WILHELMUS MARIA ,  VERMAELEN MARKUS MARTINUS PETRUS ADRIANUS ,  DE HOON CORNELIUS ADRIANUS LAMBERTUS

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus having an improved positioning accuracy of a stage thereof.
    SOLUTION: A lithographic apparatus includes: a stage that holds an object and is movable relative to a reference structure within a motion range; a magnet structure that provides a spatially varying magnetic field in at least a part of the motion range and is movable relative to the reference structure and the stage; a first position measuring system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measuring direction relative to the reference structure; a second position measuring system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor that corrects the first measurement signal with a value dependent on the second measurement signal to provide a first corrected measurement signal representing the position of the stage and/or the object in the measuring direction relative to the reference structure.
    COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种具有提高其阶段的定位精度的光刻设备。 解决方案：光刻设备包括：保持物体并且在运动范围内相对于参考结构可移动的平台; 磁体结构，其在所述运动范围的至少一部分中提供空间变化的磁场并且可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，其以取决于第二测量信号的值来校正第一测量信号，以提供表示相对于参考结构的测量方向上的台和/或物体的位置的第一校正测量信号。 版权所有（C）2011，JPO＆INPIT

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