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    Positioning device having reference frame for measuring system
    1.
    发明专利
    Positioning device having reference frame for measuring system 有权
    具有用于测量系统的参考框架的定位装置

    公开(公告)号：JP2006012866A

    公开(公告)日：2006-01-12

    申请号：JP2004126532

    申请日：2004-04-22

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： VAN ENGELEN GERARD ,  BERNHARD SPERLING FRANK ,  JANSSEN HENRICUS WILHELMUS ALO ,  BOUWER ADIANUS GERARDUS ,  VAN DIJK CORNELIS DIONYSIUS ,  VAN KIMMENADE JOHANNES MATHIJS ,  VAN EIJK JAN ,  VAN DER PAL ADRIANUS

    IPC: H01L21/027 ,  F16F15/02 ,  G03F7/20

    Abstract: PROBLEM TO BE SOLVED: To arrange a mask table (5), a projection system (3), a substrate table (1) that can be moved to the projection system (3) by a driving unit (21) and a measuring system (39) measuring the position of the substrate table (1) with respect to the projection system (3) in a lithography device. SOLUTION: The still part (157) of the driving unit (21) is fixed to the machine frame (85) of the lithography device. The still parts (51, 53 and 55) of the measuring system (39) are fixed to the reference frame (89) of the lithography device which is dynamically insulated from the machine frame (85) by a dynamic insulating device (95). Thus, vibration which occurs in the machine frame (85) is prevented from being transmitted to the reference frame (89) by reaction force of the driving unit (21), and precision of the measuring system (39) is prevented from being adversely affected by such vibration. COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：为了布置可以通过驱动单元（21）移动到投影系统（3）的掩模台（5），投影系统（3），基板台（1）和 测量系统（39）在光刻设备中测量相对于投影系统（3）的衬底台（1）的位置。 解决方案：驱动单元（21）的静止部分（157）固定到光刻设备的机架（85）上。 测量系统（39）的静止部件（51,53和55）通过动态绝缘装置（95）固定在与机架（85）动态隔离的光刻装置的基准框架（89）上。 因此，通过驱动单元（21）的反作用力，防止在机架（85）中发生的振动被传递到参考框架89，并且防止测量系统（39）的精度受到不利影响 通过这样的振动。 版权所有（C）2006，JPO＆NCIPI

    LITHOGRAPHY APPARATUS AND MOTOR USED THEREIN
    3.
    发明专利
    LITHOGRAPHY APPARATUS AND MOTOR USED THEREIN 审中-公开

    公开(公告)号：JP2003158865A

    公开(公告)日：2003-05-30

    申请号：JP2002237732

    申请日：2002-08-19

    Applicant: ASML NETHERLANDS BV

    Inventor： HOL SVEN ANTOIN JOHAN ,  VAN EIJK JAN ,  DE KLERK ANGELO CESAR PETER ,  VAN DER SCHOOT HARMEN KLAAS

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H02K41/03 ,  H02K41/035

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography projector having a Lorentz driver which can keep its performance while the weight of a back iron is reduced. SOLUTION: This Lorentz driver generates a force between its first part and second part. The Lorentz driver has a main magnet system which is attached to its first part and generates a first magnetic field; an auxiliary magnet system which is attached to its first part, is arranged in a hullback arrangement and generates a second magnetic field; and a conductive element which is attached to the second part and arranged so as to generate a force between the first and second parts of the driver by mutual reaction between a current applied thereto and the combination of the first and second magnetic fields.

    Motion detection system, lithographic apparatus, and device manufacturing method
    4.
    发明专利
    Motion detection system, lithographic apparatus, and device manufacturing method 有权
    运动检测系统，平面设备和设备制造方法

    公开(公告)号：JP2013048240A

    公开(公告)日：2013-03-07

    申请号：JP2012184855

    申请日：2012-08-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  JOHANNES PETRUS MARTINUS BERNARDUS VERMEULEN

    IPC: H01L21/027 ,  G01B11/00 ,  G01B11/26

    CPC classification number: G01B11/14 ,  G01D5/38 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To provide an improved precision measurement system which is not easily influenced by errors and does not occupy a large space.SOLUTION: A system to detect motion of a main body comprises: the main body; a first diffraction grating 40, 42 substantially stationarily attached to a reference frame; a second diffraction grating 50, 52 attached to the main body; and a detector 60, 61, 62, 63 configured to receive one or more radiation beams diffracted by the first and second diffraction gratings and detect motion of the main body relative to the reference frame. The detector 60, 61, 62, 63 is coupled to the main body, and movable relative to the main body.

    Abstract translation: 要解决的问题：提供不容易受到误差影响并且不占用大空间的改进的精密测量系统。 检测主体运动的系统包括：主体; 基本上固定地连接到参考系的第一衍射光栅40,42; 附接到主体的第二衍射光栅50,52; 以及被配置为接收由第一和第二衍射光栅衍射的一个或多个辐射束并检测主体相对于参考系的运动的检测器60,61,62,63。 检测器60,61,62,63联接到主体，并且可相对于主体移动。 版权所有（C）2013，JPO＆INPIT

    Lithographic apparatus
    6.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2014135519A

    公开(公告)日：2014-07-24

    申请号：JP2014087903

    申请日：2014-04-22

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  JOHANNES PETRUS MARTINUS BERNARDUS

    IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

    CPC classification number: G03B27/58 ,  G03F7/70716 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To reduce flexibility and resulting internal deformations by increasing stiffness and/or damping of a body of an object.SOLUTION: A positioning system to position a movable object having a body includes an object position measurement system, an object actuator, and an object controller. The positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object. The stiffener includes: one or more sensors each arranged to determine a measurement signal representative of an internal strain or relative displacement in the body; one or more actuators each arranged to exert actuation force on a part of the body; and at least one controller configured to provide, on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

    Abstract translation: 要解决的问题：通过增加物体的刚度和/或阻尼来减少柔性和产生的内部变形。解决方案：用于定位具有主体的可移动物体的定位系统包括物体位置测量系统，物体致动器， 和对象控制器。 定位系统还包括加强件，以增加刚度和/或抑制物体内部的相对运动。 加强件包括：一个或多个传感器，每个传感器被布置成确定表示身体内部应变或相对位移的测量信号; 一个或多个致动器，每个执行器被布置成在身体的一部分上施加致动力; 以及至少一个控制器，被配置为基于所述至少一个所述传感器的所述测量信号，向至少一个所述致动器提供致动信号，以增加所述刚度和/或抑制所述主体内的运动。

    Lithographic apparatus
    7.
    发明专利
    Lithographic apparatus 有权
    LITHOGRAPHIC设备

    公开(公告)号：JP2013131776A

    公开(公告)日：2013-07-04

    申请号：JP2013057644

    申请日：2013-03-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

    IPC: H01L21/027 ,  G01B11/16 ,  H01L21/68

    CPC classification number: G03B27/58 ,  G03F7/70716 ,  G03F7/70783

    Abstract: PROBLEM TO BE SOLVED: To reduce flexibility and resulting internal deformations by increasing stiffness and/or damping of a body of an object.SOLUTION: A positioning system to position a movable object having a body includes an object position measurement system, an object actuator, and an object controller. The positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object. The stiffener includes: one or more sensors each arranged to determine a measurement signal representative of an internal strain or relative displacement in the body; one or more actuators each arranged to exert actuation force on a part of the body; and at least one controller configured to provide, on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.

    Abstract translation: 要解决的问题：通过增加物体的刚度和/或阻尼来减少柔性和产生的内部变形。解决方案：用于定位具有主体的可移动物体的定位系统包括物体位置测量系统，物体致动器， 和对象控制器。 定位系统还包括加强件，以增加刚度和/或抑制物体内部的相对运动。 加强件包括：一个或多个传感器，每个传感器被布置成确定表示身体内部应变或相对位移的测量信号; 一个或多个致动器，每个执行器被布置成在身体的一部分上施加致动力; 以及至少一个控制器，被配置为基于所述至少一个所述传感器的所述测量信号，向至少一个所述致动器提供致动信号，以增加所述刚度和/或抑制所述主体内的运动。

    Lithography apparatus and device manufacturing method
    9.
    发明专利
    Lithography apparatus and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2011018902A

    公开(公告)日：2011-01-27

    申请号：JP2010150702

    申请日：2010-07-01

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN

    IPC: H01L21/027 ,  H01L21/68

    CPC classification number: G03B27/58 ,  G03F7/70775

    Abstract: PROBLEM TO BE SOLVED: To improve accuracy in positioning a substrate table and/or a supporting material.SOLUTION: The lithography apparatus includes a lighting system structured to adjust a radiation beam, a supporting material structured to support a patterning device that is capable of forming the radiation beam having a pattern by giving the pattern to the cross-section of the radiation beam, a substrate table structured to hold the substrate, and a projecting system structured to project the radiation beam having the pattern to a target part of the substrate. The substrate table and/or supporting material is or are provided with an acceleration meter for measuring acceleration of the substrate table and/or supporting material. The apparatus includes a calculator for calculating a location signal based on the acceleration from the acceleration measured by the acceleration meter through communication with the acceleration meter.

    Abstract translation: 要解决的问题：提高定位基板台和/或支撑材料的精度。解决方案：光刻设备包括构造成调节辐射束的照明系统，支撑材料，其被构造成支撑能够形成的图案形成装置 所述辐射束具有通过将所述图案赋予所述辐射束的横截面的图案，构造成保持所述衬底的衬底台，以及被构造为将具有所述图案的所述辐射束突出到所述衬底的目标部分的突出系统。 衬底台和/或支撑材料设置有用于测量衬底台和/或支撑材料的加速度的加速度计。 该装置包括：计算器，用于基于加速度计通过与加速度计通信的加速度来测量的加速度来计算位置信号。

    Lithographic apparatus, and patterning device for use in lithographic process
    10.
    发明专利
    Lithographic apparatus, and patterning device for use in lithographic process 有权
    光刻设备和用于光刻工艺的图案设备

    公开(公告)号：JP2010166037A

    公开(公告)日：2010-07-29

    申请号：JP2009281089

    申请日：2009-12-11

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VAN EIJK JAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS

    IPC: H01L21/027 ,  G01B21/00 ,  G01B21/22 ,  G03F7/20 ,  H01L21/683

    CPC classification number: G03F1/44 ,  G03B27/42 ,  G03F7/704 ,  G03F7/70516 ,  G03F7/70775 ,  G03F7/7085

    Abstract: PROBLEM TO BE SOLVED: To provide a position measuring system to a patterning device of a lithographic apparatus wherein deviation between the patterning device and a patterning device support is considered. SOLUTION: The lithographic apparatus includes an illumination system constituted to adjust a radiation beam, the patterning device support constituted to support the patterning device, the patterning device capable of imparting a pattern to a radiation beam at its cross section to form a patterned radiation beam, a substrate support constituted to hold a substrate, a projection system constituted to project the patterned radiation beam to a target of the substrate, and an encoder-type measurement system constituted to continuously determine a position quantity of the patterning device supported on the patterning device support by using a grid or a grating provided on the patterning device at least during the projection of the patterned radiation beam to a target of the substrate. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种位置测量系统到光刻设备的图案形成装置，其中考虑了图案形成装置和图案形成装置支架之间的偏差。 解决方案：光刻设备包括被配置为调节辐射束的照明系统，所述图案形成装置支撑件构造成支撑图案形成装置，所述图案形成装置能够在其横截面处向辐射束施加图案以形成图案化 辐射束，被构造成保持基板的基板支撑体，将图案化的辐射束投影到基板的目标上的投影系统;以及编码器型测量系统，被构造成连续地确定支撑在基板上的图案形成装置的位置量 至少在将图案化的辐射束投射到基板的靶时，通过使用设置在图案形成装置上的栅格或栅格的图案形成装置支撑。 版权所有（C）2010，JPO＆INPIT

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