Patent search ap:("ASML NETHERLANDS BV") AND inv:"WIJST MARC VAN DER" Page 1

1.

发明专利
Lithographic apparatus having a feed forward pressure pulse compensation for the metrology frame. 未知

公开(公告)号：NL2002902A1

公开(公告)日：2009-12-22

申请号：NL2002902

申请日：2009-05-18

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS , DUIJNHOVEN MARTINUS VAN , WIJST MARC VAN DER

IPC: G03F7/20 , H01L21/68

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